Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography

Victor V. Boksha; Anatoly I. Sharendo; Vyjacheslav E. Obukhov; Eduard I. Tochitsky

doi:10.1117/12.167332

15 February 1994 Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography

Victor V. Boksha, Anatoly I. Sharendo, Vyjacheslav E. Obukhov, Eduard I. Tochitsky

Proceedings Volume 2091, Microelectronic Processes, Sensors, and Controls; (1994) https://doi.org/10.1117/12.167332
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

Aberration research in the optic system was conducted by finding possible angles between the axis of the illuminator and a lens on the basis of the analysis of intensity on the image plane. Intensity distribution was drawn after calculation of aberration deformations of the wave front. Quality of the image of three lines with crosscut size of 0.5, 1.0 and 3.0 micrometers on the margin of 5 X 5 mm field was investigated with the worse variant taken into account.

Citation Download Citation

Victor V. Boksha, Anatoly I. Sharendo, Vyjacheslav E. Obukhov, and Eduard I. Tochitsky "Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); https://doi.org/10.1117/12.167332

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