Aberration averaging using point spread function for scanning projection systems

Hiroshi Ooki; Tomoya Noda; Koichi Matsumoto

doi:10.1117/12.389044

5 July 2000 Aberration averaging using point spread function for scanning projection systems

Hiroshi Ooki, Tomoya Noda, Koichi Matsumoto

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389044
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Scanning projection system plays a leading part in current DUV optical lithography. It is frequently pointed out that the mechanically induced distortion and field curvature degrade image quality after scanning. On the other hand, the aberration of the projection lens is averaged along the scanning direction. This averaging effect reduces the residual aberration significantly. The aberration averaging based on the point spread function and phase retrieval technique in order to estimate the effective wavefront aberration after scanning is described in this paper. Our averaging method is tested using specified wavefront aberration, and its accuracy is discussed based on the measured wavefront aberration of recent Nikon projection lens.

Citation Download Citation

Hiroshi Ooki, Tomoya Noda, and Koichi Matsumoto "Aberration averaging using point spread function for scanning projection systems", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389044

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