Paper
4 August 1993 Developments in 2D AFM metrology
Diana Nyyssonen
Author Affiliations +
Abstract
In a previous paper, a 2D atomic force probe metrology system was described. The system consists of a 2D atomic force probe used in attractive mode (non-contact) with a laser inter- ferometer system for measuring sample displacement with nanometer sensitivity. The force probe consists of a square cantilever and specially designed 2D tip. The tip and cantilever are vibrated in 2D and the shift in resonance as the surface approaches is used for surface sensing. The system is able to measure submicrometer lines and trenches with accuracy and precision at the nanometer level. This paper will discuss operational characteristics of the system and the application of 2D AFM metrology to calibration of optical and scanning electron microscope system.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diana Nyyssonen "Developments in 2D AFM metrology", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148949
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Metrology

Atomic force microscopy

Motion measurement

Semiconducting wafers

Interferometry

Scanning electron microscopy

Calibration

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