Paper
25 November 1992 Sputtered NiOx thin films as electrochromic materials
Yueyan Shi, Yimin Yang, Zhiqiang Yin
Author Affiliations +
Proceedings Volume 1728, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Chromogenics for Smart Windows; (1992) https://doi.org/10.1117/12.130550
Event: Optical Materials Technology for Energy Efficiency and Solar Energy, 1992, Toulouse-Labege, France
Abstract
Ni-O thin films have been produced onto ITO coated glass using the dc magnetron sputtering technique. The colored and bleached states of Ni-O films have been obtained by applying alternatively a positive 0.8 V potential and a negative 1.0 V potential to the sample (WE). Normal transmittance of Ni-O films in the colored and bleached states have been measured in the wavelength range of 0.35 - 2.5 micrometers by spectrophotometer.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yueyan Shi, Yimin Yang, and Zhiqiang Yin "Sputtered NiOx thin films as electrochromic materials", Proc. SPIE 1728, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Chromogenics for Smart Windows, (25 November 1992); https://doi.org/10.1117/12.130550
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KEYWORDS
Thin films

Electrodes

Glasses

Sputter deposition

Nickel

Oxides

Spectrophotometry

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