Application of a 2-D atomic force microscope system to metrology

Diana Nyyssonen; Laszlo Landstein; E. Coombs

doi:10.1117/12.134902

1 February 1992 Application of a 2-D atomic force microscope system to metrology

Diana Nyyssonen, Laszlo Landstein, E. Coombs

Proceedings Volume 1556, Scanning Microscopy Instrumentation; (1992) https://doi.org/10.1117/12.134902
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

This paper describes a 2-D atomic force microprobe (AFM) system designed specifically for accurate submicron critical dimension (CD) metrology. The system includes 2-D AFM sensing, 3-D position interferometry with 1.25 nm sensitivity, and a special tip design. Unlike conventional AFM scanning systems, the system operates like a nanorobot moving from point to point under computer control and sensing surfaces without making contact. The system design, operating characteristics, and application to metrology are

Citation Download Citation

Diana Nyyssonen, Laszlo Landstein, and E. Coombs "Application of a 2-D atomic force microscope system to metrology", Proc. SPIE 1556, Scanning Microscopy Instrumentation, (1 February 1992); https://doi.org/10.1117/12.134902

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