Spherical pinch x-ray generator prototype for microlithography

Kenji Kawai; Emilio Panarella; D. Mostacci

doi:10.1117/12.47366

1 August 1991 Spherical pinch x-ray generator prototype for microlithography

Kenji Kawai, Emilio Panarella, D. Mostacci

Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47366
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.

Citation Download Citation

Kenji Kawai, Emilio Panarella, and D. Mostacci "Spherical pinch x-ray generator prototype for microlithography", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47366

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