Paper
25 June 1999 Vacuum spark and spherical pinch x-ray/EUV point sources
Frank F. Wu, Wen-Chieh Tang, Kazimierz W. Wirpszo, Emilio Panarella
Author Affiliations +
Abstract
The technology of x-ray/EUV point plasma sources is competing with the multiple beam synchrotrons as radiation sources for submicron lithography. The company ALFT has been doing research and development on two plasma point sources for several years now. They are the vacuum spark (VSX) and spherical pinch (SPX) technologies. Both have a long history of previous research to support the contention that are well qualified to be converted into technological tools for the manufacturing of the next generation of IC chips. The VSX is essentially a miniature discharge capable of emitting soft x-ray radiation. Because the plasma emits a small dose of x- ray in each spark, it is necessary to repeat the phenomenon at high frequency in order to meet the requirement for microlithography. The SPX is mainly a strong source of EUV/X-ray radiation that operates at a frequency of one hertz or more.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank F. Wu, Wen-Chieh Tang, Kazimierz W. Wirpszo, and Emilio Panarella "Vacuum spark and spherical pinch x-ray/EUV point sources", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351113
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications and 3 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
X-rays

Plasma

Spherical lenses

Optical lithography

Capacitors

Beryllium

X-ray sources

RELATED CONTENT


Back to Top