Pulsed HF chemical laser using a VUV phototriggered discharge

Henri Brunet; Michel Mabru; J. Rocca Serra; C. Vannier

doi:10.1117/12.25955

1 February 1991 Pulsed HF chemical laser using a VUV phototriggered discharge

Henri Brunet, Michel Mabru, J. Rocca Serra, C. Vannier

Proceedings Volume 1397, 8th Intl Symp on Gas Flow and Chemical Lasers; (1991) https://doi.org/10.1117/12.25955
Event: Eighth International Symposium on Gas-Flow and Chemical Lasers, 1990, Madrid, Spain

Abstract

A simple corona phototriggered discharge has been operated in SF6/C2H6/Ne mixture at typical pressures 90-110 Torr, deposited energies up to 180 J/l and has resulted in the production of high energy HF laser pulse aroung 2.8 ?m. The maximum laser energy was 3.8 J per pulse which corresponds to a specific energy of 7 J/liter and to an efficiency of 4 % based upon the energy stored on the sustaining capacitor. Results of discharge modeling have shown that F atoms were mainly produced by electron excitation of SF6 dissociative electronic states.

Citation Download Citation

Henri Brunet, Michel Mabru, J. Rocca Serra, and C. Vannier "Pulsed HF chemical laser using a VUV phototriggered discharge", Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); https://doi.org/10.1117/12.25955

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