Modeling of a photolytically excited HF chemical laser based on a NF3/H2 gas mixture

Marc P. Sabonnadiere; Vadim I. Tcheremiskine; Marc L. Sentis; L. D. Mikheev; Philippe Ch. Delaporte

doi:10.1117/12.334500

22 December 1998 Modeling of a photolytically excited HF chemical laser based on a NF₃/H₂ gas mixture

Marc P. Sabonnadiere, Vadim I. Tcheremiskine, Marc L. Sentis, L. D. Mikheev, Philippe Ch. Delaporte

Proceedings Volume 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1998) https://doi.org/10.1117/12.334500
Event: Twelfth International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 1998, St. Petersburg, Russian Federation

Abstract

A numerical code has been developed to simulate the characteristics of HF chemical laser based on non-chain reaction pumped by a planar sliding discharge radiation. The model considers transport of VUV pump radiation through the nonlinear absorptive active medium containing NF₃/H₂/N₂/Ar gas mixture coupled with chemical and lasing kinetics describing the temporal and spatial evolution of particle species concentration and intracavity lasing photons density. The relative importance of various kinetic processes is evaluated and a 3.2 J/l laser output specific energy is calculated along the laser axis.

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Marc P. Sabonnadiere, Vadim I. Tcheremiskine, Marc L. Sentis, L. D. Mikheev, and Philippe Ch. Delaporte "Modeling of a photolytically excited HF chemical laser based on a NF₃/H₂ gas mixture", Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); https://doi.org/10.1117/12.334500

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