Design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission

Dennis P. Atkinson; Jay V. Bixler; Paul Geraghty; Charles J. Hailey; Jeffrey L. Klingmann; Richard C. Montesanti; Steven M. Kahn; Frits B. S. Paerels

doi:10.1117/12.23226

1 February 1991 Design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission

Dennis P. Atkinson, Jay V. Bixler, Paul Geraghty, Charles J. Hailey, Jeffrey L. Klingmann, Richard C. Montesanti, Steven M. Kahn, Frits B. S. Paerels

Author Affiliations +

Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23226
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

The Reflection Grating Spectrometer Experiment (RGS), which has been selected for flight on the European Space Agency's X-Ray Multi-Mirror Mission (XMM), includes two arrays of reflection gratings that are placed in the X-ray optical path behind two separate grazing incidence X-ray telescopes. Each of the grating arrays picks off roughly half the X-ray light emanating from its telescope and diffracts it to a dedicated strip of charge-coupled device (CCD) detectors offset from the telescope focal plane. The arrays contain 224 100 mm X 200 mm gratings, each mounted at a graze angle of 1.58° to the incident beam. The gratings are produced by epoxy replication of a common master onto very thin substrates. Both the gratings and the detectors are mounted on a Rowland circle which also includes the telescope focus. In this paper, we review the current state of both the engineering and the optical designs for the grating arrays.

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Dennis P. Atkinson, Jay V. Bixler, Paul Geraghty, Charles J. Hailey, Jeffrey L. Klingmann, Richard C. Montesanti, Steven M. Kahn, and Frits B. S. Paerels "Design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23226

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