Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO2 sol-gel to obtain micro-nanostructured ZrN

V. Vallejo Otero; N. Crespo-Monteiro; A. Valour; C. Donnet; S. Reynaud; N. Ollier; M. F. Blanc-Mignon; J. P. Chatelon; Y. Bleu; E. Gamet; Y. Jourlin

doi:10.1117/12.3016633

24 June 2024 Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO₂ sol-gel to obtain micro-nanostructured ZrN

V. Vallejo Otero, N. Crespo-Monteiro, A. Valour, C. Donnet, S. Reynaud, N. Ollier, M. F. Blanc-Mignon, J. P. Chatelon, Y. Bleu, E. Gamet, Y. Jourlin

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Proceedings Volume 13020, Advances in Optical Thin Films VIII; 130200M (2024) https://doi.org/10.1117/12.3016633
Event: SPIE Optical Systems Design, 2024, Strasbourg, France

Abstract

Zirconium nitride (ZrN) combines plasmonic properties in the visible and near infrared spectral region with good mechanical properties, high thermal and chemical stability making it a very promising alternative to noble metals for optical applications at high temperature or in extreme environments. The authors present a new process for the elaboration of micro-nanostructured ZrN from a photo-patternable ZrO₂ sol-gel and a nitridation process, by rapid thermal annealing. This sol-gel is patternable by optical lithography, it allows to easily and quickly produce patterned ZrN layer.

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V. Vallejo Otero, N. Crespo-Monteiro, A. Valour, C. Donnet, S. Reynaud, N. Ollier, M. F. Blanc-Mignon, J. P. Chatelon, Y. Bleu, E. Gamet, and Y. Jourlin "Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO₂ sol-gel to obtain micro-nanostructured ZrN", Proc. SPIE 13020, Advances in Optical Thin Films VIII, 130200M (24 June 2024); https://doi.org/10.1117/12.3016633

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