Polymer sequencer to demystifying sequence–line-edge roughness correlation

Masanobu Naito; Yusuke Hibi

doi:10.1117/12.3009962

10 April 2024 Polymer sequencer to demystifying sequence–line-edge roughness correlation

Masanobu Naito, Yusuke Hibi

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295727 (2024) https://doi.org/10.1117/12.3009962
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Line-edge roughness (LER) in polymer photo-resist technology is a crucial factor limiting spatial resolution. The impact of inhomogeneous monomer sequences on LER remains unclear despite efforts to narrow sequence distribution during polymerization. To unravel this sequence-LER correlation, a polymer sequencer using pyrolysis mass spectrometry is introduced. It identifies and quantifies short sequence populations termed "codons," even amidst random copolymer fragmentation. Codon complexity increases with length and monomer components. A data-driven approach accommodates growing complexities, enabling quantification of codon compositions for binary and ternary triads with small datasets. This sequencer sheds light on the sequence-LER relationship, offering valuable insights into copolymer properties.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Masanobu Naito and Yusuke Hibi "Polymer sequencer to demystifying sequence–line-edge roughness correlation", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295727 (10 April 2024); https://doi.org/10.1117/12.3009962

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