Line-edge roughness (LER) in polymer photo-resist technology is a crucial factor limiting spatial resolution. The impact of inhomogeneous monomer sequences on LER remains unclear despite efforts to narrow sequence distribution during polymerization. To unravel this sequence-LER correlation, a polymer sequencer using pyrolysis mass spectrometry is introduced. It identifies and quantifies short sequence populations termed "codons," even amidst random copolymer fragmentation. Codon complexity increases with length and monomer components. A data-driven approach accommodates growing complexities, enabling quantification of codon compositions for binary and ternary triads with small datasets. This sequencer sheds light on the sequence-LER relationship, offering valuable insights into copolymer properties.
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