Organic dry development rinse (O-DDR) process for spin-on MOR to prevent pattern collapse

Seonggil Heo; Seungjoo Baek; Mihir Gupta; Hyo Seon Suh; Kodai Kato; Satoshi Takeda; Wataru Shibayama; Rikimaru Sakamoto

doi:10.1117/12.3011118

9 April 2024 Organic dry development rinse (O-DDR) process for spin-on MOR to prevent pattern collapse

Seonggil Heo, Seungjoo Baek, Mihir Gupta, Hyo Seon Suh, Kodai Kato, Satoshi Takeda, Wataru Shibayama, Rikimaru Sakamoto

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295710 (2024) https://doi.org/10.1117/12.3011118
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Pattern collapse emerges as a key factor leading to the failure of photoresist patterns in high-resolution EUV lithography. Its significance escalates as feature sizes decrease and pitches become smaller transitioning to high-NA EUV, potentially leading to challenges with regards to resolution. Collapse arises from capillary forces acting on the resist surface during wafer drying. Consequently, the optimal strategy to mitigate pattern collapse involves eliminating any drying steps post-lithography processing. In this study, we introduce the O-DDR process for spin-on MOR, effectively eliminating capillarity and eradicating the pattern collapse issue without tone inversion. Figure 1 illustrates the O-DDR process, which involves dispensing O-DDR material instead of employing a spin-drying developer, without introducing any extra processing steps. After the dry etching process, we observe that the resist pattern remains intact without any collapse. Furthermore, we conduct an analysis of the O-DDR process, with the goal of expanding the window for a failure-free process with pitch 32nm pillars and pitch 28nm line and space in EUV lithography.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Seonggil Heo, Seungjoo Baek, Mihir Gupta, Hyo Seon Suh, Kodai Kato, Satoshi Takeda, Wataru Shibayama, and Rikimaru Sakamoto "Organic dry development rinse (O-DDR) process for spin-on MOR to prevent pattern collapse", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295710 (9 April 2024); https://doi.org/10.1117/12.3011118

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