Enhancing process stability and defect control in advanced EUV lithography via innovative track systems

Elke Caron; Andreia Santos; Wesley Zanders; Jelle Vandereyken; Seonggil Heo; Masahiko Harumoto

doi:10.1117/12.3011129

9 April 2024 Enhancing process stability and defect control in advanced EUV lithography via innovative track systems

Elke Caron, Andreia Santos, Wesley Zanders, Jelle Vandereyken, Seonggil Heo, Masahiko Harumoto

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295720 (2024) https://doi.org/10.1117/12.3011129
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

In the ever-evolving landscape of semiconductor manufacturing, ensuring impeccable process stability and defect control remains crucial in modern lithography. These elements have driven the maturation of the entire extreme ultraviolet (EUV) lithography ecosystem, which is now geared to meet the upcoming challenges. A critical component of this ecosystem is the lithography track, whose performance capabilities have been evolving rapidly to keep pace with technology roadmap advancements. In this study, we present the capabilities of novel hardware solutions integrated into SCREEN's DT-3000 coat-develop track system when applied to metal oxide resist (MOR) platforms. We demonstrate how hardware development remains a fundamental driver for enhancing not only process stability and defect control but also for optimizing additional critical metrics such as resolution, line width roughness (LWR), defect-free window, and pattern shape. These advancements underscore the continued importance of hardware innovation in the semiconductor manufacturing landscape and its indispensable role in supporting the transition to high-NA EUVL technology, ensuring high-quality and reliable production.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Elke Caron, Andreia Santos, Wesley Zanders, Jelle Vandereyken, Seonggil Heo, and Masahiko Harumoto "Enhancing process stability and defect control in advanced EUV lithography via innovative track systems", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295720 (9 April 2024); https://doi.org/10.1117/12.3011129

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available