Poster + Paper
30 April 2023 Novel polymer design for ultra-low stress material for advanced packaging applications
F. Meyer, M. Koch, K. Nishikawa, G. Larbig, K. Taniguchi
Author Affiliations +
Conference Poster
Abstract
Multi-RDL architectures in WLP are pushing established materials like polyimide to their limits. Key limitations of these material are high temperature curing and shrinkage which leads to warpage and yield losses. We are developing a dielectric packaging material that has minimal stress upon curing while being compatible with established packaging processes. Another goal is to keep dielectric constant and loss factor as low as possible to ensure compatibility with high frequency applications. Additional feature for this new polymer class is high temperature stability.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Meyer, M. Koch, K. Nishikawa, G. Larbig, and K. Taniguchi "Novel polymer design for ultra-low stress material for advanced packaging applications", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124981R (30 April 2023); https://doi.org/10.1117/12.2658391
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polymers

Dielectrics

Polymer thin films

Semiconducting wafers

Shrinkage

Coating stress

Ultraviolet radiation

Back to Top