Simulation and optimization of etch on flexible substrates for roll-to-roll processing

Sofia Helpert; Yang Ban; Meghali Chopra; Roger T. Bonnecaze

doi:10.1117/12.2515104

20 March 2019 Simulation and optimization of etch on flexible substrates for roll-to-roll processing

Sofia Helpert, Yang Ban, Meghali Chopra, Roger T. Bonnecaze

Proceedings Volume 10963, Advanced Etch Technology for Nanopatterning VIII; 109630T (2019) https://doi.org/10.1117/12.2515104
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

A methodology is presented to virtually predict etch profiles on flexible substrates across multi-dimensional process spaces using a minimal number of calibration experiments. Simulations and predictions of the physics and chemical kinetics of plasma etch on flexible substrates are performed using the commercial software SandBox StudioTM. The evolution of a trench profile is computed using surface kinetics models and the level set method. Local etch rates include visibility effects to account for partial shielding of the etch as the pattern is developed and the effects of redeposition. The results of the experiments are then used to update the calibrated model parameters. If the process objectives (e.g., sidewall angle, trench critical dimensions, and across the web uniformity) are not achieved, then a new set of experiments is suggested by the methodology. The process is repeated until the optimal process conditions are identified. The methodology is validated by experiments on etching line-space patterns of polysilicon films on polymer substrates. Results with reactive ion etching with either CF₄ and HBr are shown and the optimal etch recipes (power, etch time and gas flow rates) determined. It is found that this coupled simulation-experiment approach is much more efficient than full factorial experimental design at predicting process outcomes. The methodology presented requires 66% fewer experiments reducing the cost of development by a factor of three.

Conference Presentation

Citation Download Citation

Sofia Helpert, Yang Ban, Meghali Chopra, and Roger T. Bonnecaze "Simulation and optimization of etch on flexible substrates for roll-to-roll processing", Proc. SPIE 10963, Advanced Etch Technology for Nanopatterning VIII, 109630T (20 March 2019); https://doi.org/10.1117/12.2515104

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