Rapid recipe formulation for plasma etching of new materials

Meghali Chopra; Zizhuo Zhang; John Ekerdt; Roger T. Bonnecaze

doi:10.1117/12.2219171

16 March 2016 Rapid recipe formulation for plasma etching of new materials

Meghali Chopra, Zizhuo Zhang, John Ekerdt, Roger T. Bonnecaze

Proceedings Volume 9781, Design-Process-Technology Co-optimization for Manufacturability X; 978111 (2016) https://doi.org/10.1117/12.2219171
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

A fast and inexpensive scheme for etch rate prediction using flexible continuum models and Bayesian statistics is demonstrated. Bulk etch rates of MgO are predicted using a steady-state model with volume-averaged plasma parameters and classical Langmuir surface kinetics. Plasma particle and surface kinetics are modeled within a global plasma framework using single component Metropolis Hastings methods and limited data. The accuracy of these predictions is evaluated with synthetic and experimental etch rate data for magnesium oxide in an ICP-RIE system. This approach is compared and superior to factorial models generated from JMP, a software package frequently employed for recipe creation and optimization.

Citation Download Citation

Meghali Chopra, Zizhuo Zhang, John Ekerdt, and Roger T. Bonnecaze "Rapid recipe formulation for plasma etching of new materials", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978111 (16 March 2016); https://doi.org/10.1117/12.2219171

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