Spin-on metal oxide materials for N7 and beyond patterning applications

G. Mannaert; E. Altamirano-Sanchez; T. Hopf; F. Sebaai; C. Lorant; C. Petermann; S.-E. Hong; S. Mullen; E. Wolfer; D. Mckenzie; H. Yao; D. Rahman; J.-Y. Cho; M. Padmanaban; D. Piumi

doi:10.1117/12.2264323

7 April 2017 Spin-on metal oxide materials for N7 and beyond patterning applications

G. Mannaert, E. Altamirano-Sanchez, T. Hopf, F. Sebaai, C. Lorant, C. Petermann, S.-E. Hong, S. Mullen, E. Wolfer, D. Mckenzie, H. Yao, D. Rahman, J.-Y. Cho, M. Padmanaban, D. Piumi

Author Affiliations +

Proceedings Volume 10149, Advanced Etch Technology for Nanopatterning VI; 101490T (2017) https://doi.org/10.1117/12.2264323
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

There is a growing interest in new spin on metal oxide hard mask materials for advanced patterning solutions both in BEOL and FEOL processing. Understanding how these materials respond to plasma conditions may create a competitive advantage. In this study patterning development was done for two challenging FEOL applications where the traditional Si based films were replaced by EMD spin on metal oxides, which acted as highly selective hard masks. The biggest advantage of metal oxide hard masks for advanced patterning lays in the process window improvement at lower or similar cost compared to other existing solutions.

Citation Download Citation

G. Mannaert, E. Altamirano-Sanchez, T. Hopf, F. Sebaai, C. Lorant, C. Petermann, S.-E. Hong, S. Mullen, E. Wolfer, D. Mckenzie, H. Yao, D. Rahman, J.-Y. Cho, M. Padmanaban, and D. Piumi "Spin-on metal oxide materials for N7 and beyond patterning applications", Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490T (7 April 2017); https://doi.org/10.1117/12.2264323

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