Advanced fast 3D DSA model development and calibration for design technology co-optimization

Kafai Lai; Balint Meliorisz; Thomas Muelders; Ulrich Welling; Hans-Jürgen Stock; Sajan Marokkey; Wolfgang Demmerle; Chi-Chun Liu; Cheng Chi; Jing Guo

doi:10.1117/12.2260379

27 April 2017 Advanced fast 3D DSA model development and calibration for design technology co-optimization

Kafai Lai, Balint Meliorisz, Thomas Muelders, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Wolfgang Demmerle, Chi-Chun Liu, Cheng Chi, Jing Guo

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Proceedings Volume 10144, Emerging Patterning Technologies; 101440H (2017) https://doi.org/10.1117/12.2260379
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Direct Optimization (DO) of a 3D DSA model is a more optimal approach to a DTCO study in terms of accuracy and speed compared to a Cahn Hilliard Equation solver. DO’s shorter run time (10X to 100X faster) and linear scaling makes it scalable to the area required for a DTCO study. However, the lack of temporal data output, as opposed to prior art, requires a new calibration method. The new method involves a specific set of calibration patterns. The calibration pattern’s design is extremely important when temporal data is absent to obtain robust model parameters. A model calibrated to a Hybrid DSA system with a set of device-relevant constructs indicates the effectiveness of using nontemporal data. Preliminary model prediction using programmed defects on chemo-epitaxy shows encouraging results and agree qualitatively well with theoretical predictions from a strong segregation theory.

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Kafai Lai, Balint Meliorisz, Thomas Muelders, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Wolfgang Demmerle, Chi-Chun Liu, Cheng Chi, and Jing Guo "Advanced fast 3D DSA model development and calibration for design technology co-optimization", Proc. SPIE 10144, Emerging Patterning Technologies, 101440H (27 April 2017); https://doi.org/10.1117/12.2260379

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