Paper
20 October 2016 A study of SU-8 photoresist in deep trenches for silicon-embedded microinductors
Elias Laforge, Caroline Rabot, Ningning Wang, Zoran Pavlovic, Paul McCloskey, Cian O'Mathúna
Author Affiliations +
Proceedings Volume 10032, 32nd European Mask and Lithography Conference; 100320O (2016) https://doi.org/10.1117/12.2247894
Event: 32nd European Mask and Lithography Conference, 2016, Dresden, Germany
Abstract
Epoxy-based resist SU-8 is widely used in the development and fabrication of high-aspect-ratio (HAR) MEMS structures. It has proven to be a suitable photoresist combining thick layer coating and good adhesion on silicon substrates as well as possessing good mechanical and chemical stability. However, the trend towards minia- turization and increasing packaging density has pushed the demand for challenging micro-machining processes. As an example, a novel design of a MEMS microinductor requires a dielectric permanent layer coated in deep silicon trenches in order to insulate copper windings from the magnetic material deposited in these trenches. This requires the development of a photolithography process which enables the coating of a void-free layer filling the trenches. In this paper, the use of thick SU-8 photoresist for filling deep silicon trenches is investigated. Different SU-8 formulations are analyzed, processed and results are compared. As a result, an optimized process is developed to achieve void-free filled trenches and a uniform planar layer above them, with near vertical sidewall patterns.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elias Laforge, Caroline Rabot, Ningning Wang, Zoran Pavlovic, Paul McCloskey, and Cian O'Mathúna "A study of SU-8 photoresist in deep trenches for silicon-embedded microinductors", Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 100320O (20 October 2016); https://doi.org/10.1117/12.2247894
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KEYWORDS
Photoresist materials

Silicon

Magnetism

Coating

Semiconducting wafers

Copper

Microelectromechanical systems

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