Model of blocking dislocations for III-V semiconductor grown on nano-trench patterned Si substrates

Haoyuan Ma; Jun Wang; Zhuo Cheng; Yibing Fan; Ran Zhang; Yuanyuan Liu; Yongqing Huang; Xiaomin Ren

doi:10.1117/12.2245684

4 November 2016 Model of blocking dislocations for III-V semiconductor grown on nano-trench patterned Si substrates

Haoyuan Ma, Jun Wang, Zhuo Cheng, Yibing Fan, Ran Zhang, Yuanyuan Liu, Yongqing Huang, Xiaomin Ren

Proceedings Volume 10027, Nanophotonics and Micro/Nano Optics III; 100271B (2016) https://doi.org/10.1117/12.2245684
Event: SPIE/COS Photonics Asia, 2016, Beijing, China

Abstract

In epitaxial lateral overgrowth (ELOG) of III-V semiconductor on nano-trench patterned Si substrates, the most important mechanism is aspect ratio trapping, which uses high aspect ratio nano-trenches to trap threading dislocations (TDs). A model based on the theory of dislocation is proposed to calculate proportion of blocking threading dislocations in ELOG of GaAs or InP on nano-trench patterned Si substrates. The model establishes relationship with the structure of nano-trenches and the proportion of blocking threading dislocations. It is found that, the blocking proportion is determined by thickness of the masks, width of the trenches and direction of the nano-trenches (the angle of opening orientations lies off the [110] direction). The blocking proportion gradually increases until 100% as aspect ratio increases with fixed trench direction; with the same aspect ratio, the blocking proportion firstly decreases from 0° to 45°, and symmetrically increases from 45° to 90°. It is worth noting that the blocking proportion abruptly reduces to 50% when the direction is 45°and the aspect ratio is more than 1; But it does not happen if the aspect ratio is less than or equal to 1. The reported experimental results are well consistent with the model. The model provides a method for optimization of nano-trench patterned substrates for more effectively blocking threading dislocations in III-V semiconductors.

Citation Download Citation

Haoyuan Ma, Jun Wang, Zhuo Cheng, Yibing Fan, Ran Zhang, Yuanyuan Liu, Yongqing Huang, and Xiaomin Ren "Model of blocking dislocations for III-V semiconductor grown on nano-trench patterned Si substrates", Proc. SPIE 10027, Nanophotonics and Micro/Nano Optics III, 100271B (4 November 2016); https://doi.org/10.1117/12.2245684

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Silicon

Group III-V semiconductors

Solids

Epitaxial lateral overgrowth

Gallium arsenide

Photomasks

Photonics

Show All Keywords

Keywords/Phrases

Search In:

Publication Years