Paper
20 August 1986 Renewed Energy For The Perkin-Elmer 140, 240, 340 Projection Printers
John Lent
Author Affiliations +
Abstract
It is a generally accepted fact that the ability to extend the life of any expensive fab equipment with a reasonable investment which provides quick pay back is a desirable goal. Recently a modification to Perkin-Elmer projection printers has been announced which should fall into the above category. This modification consists of a new illumination source. Unlike previous attempts which primarily dealt with lamp issues, this unit replaces the entire HPC, to include; lamp, lamp supply, blower, forced air cooling and major lamp electronics. This paper discusses the modifications necessary to the 341, an in depth performance comparison of the model 341 equipped with the Advanced Semiconductor Product Illuminator to the same instrument prior to modification, and production results using the system. The first topic of the paper will look at the changes required to the 340 when installing the ASP system. We will look briefly at the optical layout of the system and how it differs from the standard HPC. We will then address the optical, mechanical, electrical, pneumatic changes, and the complexity of the installation. The second topic of the paper will look at a comparison of the original instrument specifications to the modified system. This look will include parameters such as CD control, uniformity of illumination, vibration analysis of each system, depth of focus, spectral output of each system from the standpoint of both spectral distribution and total energy output, exposure and other process issues affected by the new system. We will conclude with production results such as uptime, CD control as compared to standard systems, long term throughput increase achieved through a number of months of system operation, maintenance complexity and overall Fab acceptance.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Lent "Renewed Energy For The Perkin-Elmer 140, 240, 340 Projection Printers", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963722
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lamps

Fiber optic illuminators

Optical lithography

Printing

Semiconducting wafers

Systems modeling

Control systems

RELATED CONTENT

Goal-Oriented Process Tuning
Proceedings of SPIE (September 05 1980)
Step And Repeat Wafer Imaging
Proceedings of SPIE (September 06 1978)
Automated Wafer Flatness Characterization System
Proceedings of SPIE (July 28 1981)
Performance Evaluation Of A Practical 248nm Wafer Stepper
Proceedings of SPIE (September 01 1987)
A Better Mousetrap
Proceedings of SPIE (July 17 1979)

Back to Top