Liquid Particle Counting Of Photoresists And Auxiliaries For Defect Control

Jeffrey K. Hecht; Edward J. Reardon; Douglas A. Thompson

doi:10.1117/12.963732

20 August 1986 Liquid Particle Counting Of Photoresists And Auxiliaries For Defect Control

Jeffrey K. Hecht, Edward J. Reardon, Douglas A. Thompson

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963732
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

Laser light scattering, a sensitive and versatile method, has been used to detect and classify particles in a variety of liquids. Semiconductor manufacturers have used liquid particle counting (LPC) to monitor deionized water streams and incoming chemicals. Recently, attempts have been made to extend this technology to photoresists and auxiliaries with the goal of setting specifications acceptable to both vendors and users. This paper discusses the efforts of a photoresist manufacturer to incorporate LPC into quality control and assurance. Examples of applications of LPC to other issues of photoresist purity are also provided.

Citation Download Citation

Jeffrey K. Hecht, Edward J. Reardon, and Douglas A. Thompson "Liquid Particle Counting Of Photoresists And Auxiliaries For Defect Control", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963732

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