An Expansible EB System For Submicron Lithography

Kazumitsu Nakamura; Akira Yanagisawa; Yoshio Sakitani; Tsutomu Komoda

doi:10.1117/12.963690

30 June 1986 An Expansible EB System For Submicron Lithography

Kazumitsu Nakamura, Akira Yanagisawa, Yoshio Sakitani, Tsutomu Komoda

Proceedings Volume 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V; (1986) https://doi.org/10.1117/12.963690
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

A variable shaped beam type, high accuracy high throughput EB system Model HL-600 was developed a few years ago. It has been investigated how to apply this system to higher throughput and submicron fabrication. In order to increase throughput, some modifications have been done for controlling two sets of EB units by single computer system. According to some experiments, it has been made clear that this system is applicable to a quarter micron fabrication.

Citation Download Citation

Kazumitsu Nakamura, Akira Yanagisawa, Yoshio Sakitani, and Tsutomu Komoda "An Expansible EB System For Submicron Lithography", Proc. SPIE 0632, Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (30 June 1986); https://doi.org/10.1117/12.963690

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