The Time Has Come For X-Ray Lithography

Richard L. Ruddell

doi:10.1117/12.947484

20 June 1985 The Time Has Come For X-Ray Lithography

Richard L. Ruddell

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947484
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The era is fast approaching when light optics must utilize all of its options; higher numerical aperture lens, shorter wavelength and partially coherent illumination along with process aids such as multilevel resist processes, to name a few. The relative production process difficulty of light optics and x-ray become equivalent in the 1.25μm regime. With x-ray relieving the imposed limitations of diffraction coupled with recent advances in x-ray sources, masks, alignment techniques and photoresists, it is now time to begin serious x-ray process development.

Citation Download Citation

Richard L. Ruddell "The Time Has Come For X-Ray Lithography", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947484

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