It would be possible to tune a dual-band terahertz absorber that has the polarization property and angle-insensitive is lifted in this paper, which is a typical sandwich structure consisting of a graphene structure with a chirped wheel sitting on top of the top layer, an insulating medium placed in the middle and a bottom layer gold ground plane. Simulation results show that there are two absorption peaks at 1.69THz and 4.49THz, with absorptivity of 98.73% and 99.68%, respectively. At resonant frequencies, these two absorption peaks could be varied dynamically by rescaling the graphene's chemical potential,thereby providing a novel method for developing actively tuned terahertz absorbers.
The non-resonantly enhanced optical transmission phenomenon of sub-wavelength metallic slits on a thin film is significant for broadband light integrated devices. In order to improve the EOT characteristics of sub-wavelength metallic slits further more, in this paper, wedge-shape metallic slits array embedded with rectangular cavities structure is proposed and its transmission properties are investigated using the finite element method. The results show that wedgeshape metallic slits array can achieve higher transmission compared with straight slits array embedded with rectangular cavities and the light is strongly localized and enhanced at the slit exits. We describe the phenomenon with a transmission line model. The width of entrance of the slit influences the transmission property: the transmittance can be 94%, after optimizing the structure parameters, with the widths 150nm and 30nm at the entrance and exit of the slit, respectively. The thickness of metal film influences the transmission peak position and transmission rate: when the increase of the thickness of the metal film, the transmittance increases and the transmission peak is red-shift, however, the law of long wavelength range is opposite. In addition, the effects of structural period of wedge-shaped slits embedded with rectangular cavities structure on the transmission property are also studied. These results would be helpful for optical signal transmission and the design of near field optical conductor devices with higher transmission capability.
Symmetric metallo-dielectric multilayered stacks (MDMS) are investigated to improve the spatial resolution of subwavelength imaging operated in canalization regime. Simulation results revealed that subwavelength imaging capability is very sensitive to the thickness and material of the MDMS terminal layers. Furthermore, the coupling and decoupling of the Bloch modes in MDMS, between the object and image space, strongly depend on the terminal layer parameters which can be tuned to achieve the optimal imaging improvement. In contrast to metal-dielectric periodic MDMS, using MDMS with the developed symmetric surface termination, subwavelength imaging with optimal intensity throughput and improved field spatial resolution (∼20.4% ) can be obtained. Moreover, optical singularity, in the form of Poynting vector saddle point, has been found in the free space after lens exit for the two kinds of symmetric MDMS that exhibit improved superresolution imaging performance with 100% energy flux visibility. The improved subwavelength imaging capabilities, offered by this proposed termination design method, may find potential applications in the areas of biological imaging, sensing, and deep subwavelength lithography, and many others.
A thin photochromic film on top of the resist layer can be used as a virtual mask to fabricate super-resolution lithography patterns. In this letter, based on the azobenzene polymer, the absorption intensity of the 365nm LED is effectively modulated by 532nm laser, the modulation degree reaches to 87%.When the silver nanocubes are dropped onto the surface of the polymer film, the modulation degree is significantly higher than that without the nanoparticles in the same intensity of 532nm laser due to the field enhancement of excitation of surface plasmons. The absorption modulation features of the polymer film are favorable for the further smaller line width nanolithography.
Recently, dielectric loaded surface plasmons (SPs) elements are inducing highly interesting in the field of nanooptics, which are composed of dielectric nanostructures fabricated on a metallic thin film. This configuration will provide a route to novel integrated micro-optical devices and components combining photonics and electronics on the same chip. The advantages are easy fabrication, easy integration, and also the potential to realizing active plasmonic devices. In this talk, we will present our recent work in this field. Polymer (PMMA) nano-structures are fabricated on a silver film by the electron beam lithography (EBL) and laser interference lithography. These nano-structures are used to manipulate the behaviors of the SPs, such as converging, diverging, and guiding the propagation of SPs in subwavelength scale. Except for the pure PMMA nano-structures, dye materials (Rhodamine B, RhB) doped PMMA structures are also fabricated on the silver film. The RhB molecules will work as the active medium to excite the SPs or compensation the loss of SPs wave. The dye doped PMMA nanostructure provides a choice to realize active plasmonic elements, such as SPs Bragg gratings. On the other hand, the interaction between the fluorescence molecules and SPs will give rise to some new optical phenomena, such as directional fluorescence emission, anisotropic fluorescence emission. These polymer based plasmonic structures are investigated with a home-built leakage radiation microscopy (LRM).
A designed multilayered metamaterial cavity formed by the metallo-dielectric multilayer structure (MDMS) and a nano
Aluminum layer coated substrate is exploited to achieve the sub-20 nm patterns feature sizes at the wavelength of 248
nm with p-polarization. The filtering and SPP cavity resonance coupling provided by this MDMS cavity regime enable
the SPP interference patterns with high uniformity and intensity output in the photoresist (PR) layer. Furthermore,
compared with the conventional grating metal waveguide structure, this lithography system demonstrates the better
stability of patterns period against the cavity thickness variation. The enhancement and the longitudinal extension of SPP
localized field offered by the proposed cavity scheme will provide a potential way to obtain the lithography patterns with
improved depth, contrast and perpendicularity.
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