Dr. Zhiyu J. Zhang
at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 673016 (2007) https://doi.org/10.1117/12.746707
KEYWORDS: Data modeling, Photomasks, Printing, Photoresist processing, Nanoimprint lithography, Extreme ultraviolet lithography, Image quality, Optical lithography, Image enhancement, Semiconducting wafers

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6517, 65172P (2007) https://doi.org/10.1117/12.713447
KEYWORDS: Data modeling, Nanoimprint lithography, Lithographic illumination, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, 3D modeling, Semiconducting wafers, Cadmium sulfide, Photomasks

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