Dr. Zheng G. Chen Profile

Dr. Zheng G. Chen

Lithography engineer

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 28 April 2023 Presentation + Paper

EUV sub-resolution assist feature impact: experimental and simulation evaluation

Zheng Chen, Martin Burkhardt, Stuart Sieg, Luciana Meli

Proceedings Volume 12494, 124940U (2023) https://doi.org/10.1117/12.2657634

KEYWORDS: SRAF, Light sources and illumination, Printing, Electroluminescence, Line edge roughness, Extreme ultraviolet, Nickel, 3D mask effects, Semiconducting wafers, Finite element methods

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Proceedings Article | 13 June 2022 Presentation

Feasibility study of machine learning modeling for full chip optical proximity correction

Yuping Cui, Jing Xue, Jing Sha, Zheng Guo Chen, Larry Zhuang, Derren Dunn, Jeffrery Shearer, Li-Jin Chen, Rich Wu, Charlie King

Proceedings Volume 12052, 120520R (2022) https://doi.org/10.1117/12.2614060

KEYWORDS: Optical proximity correction, Machine learning, Data modeling, Neural networks, Process modeling, Photomasks, Wafer-level optics, Semiconducting wafers, Lithography, Photoresist processing

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Proceedings Article | 26 May 2022 Presentation + Paper

Focus considerations of design pitches and absorber choice for EUV random logic

Martin Burkhardt, Zheng Chen, Scott Halle, Romain Lallement, Stuart Sieg, Luciana Meli

Proceedings Volume 12051, 120510C (2022) https://doi.org/10.1117/12.2614296

KEYWORDS: Nickel, Photomasks, Extreme ultraviolet, SRAF, Phase shifts, Absorption, Diffraction, Optical lithography, Tantalum

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Proceedings Article | 20 March 2018 Presentation + Paper

Line edge roughness reduction for 7nm metals

Zheng Chen, Steven McDermott, Christopher Ordonio, Ao Chen, Bradley Morgenfeld, Geng Han

Proceedings Volume 10587, 1058708 (2018) https://doi.org/10.1117/12.2297424

KEYWORDS: Line edge roughness, Etching, Lithography, Optical lithography, Photoresist processing, 193nm lithography

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Proceedings Article | 26 March 2007 Paper

Optical error sensitivities of immersion lithography

Zheng Chen, Kafai Lai, Ken Racette

Proceedings Volume 6520, 652013 (2007) https://doi.org/10.1117/12.712333

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Error analysis, Imaging systems, Immersion lithography, Optical proximity correction, Finite element methods, Diffraction, Monochromatic aberrations

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Proceedings Article | 12 May 2005 Paper

First microprocessors with immersion lithography

D. Gil, T. Bailey, D. Corliss, M. Brodsky, P. Lawson, M. Rutten, Z. Chen, N. Lustig, T. Nigussie, K. Petrillo, C. Robinson

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598855

KEYWORDS: Semiconducting wafers, Immersion lithography, Scanners, Lithography, Critical dimension metrology, Semiconductor manufacturing, Manufacturing, Bacteria, Resistance, Polishing

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Proceedings Article | 4 May 2005 Paper

A new long range proximity effect in chemically amplified photoresist processes: chemical flare

Timothy Brunner, Z. Chen, Kuang-Jung Chen, S. Scheer

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598822

KEYWORDS: Photoresist processing, Photomasks, Semiconducting wafers, Image processing, Critical dimension metrology, Chemical reactions, Lithography, Optical proximity correction, Atomic force microscopy, Photoresist materials

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Proceedings Article | 14 September 2001 Paper

When is bilayer thin-film imaging suitable: comparison with single-layer resists

Scott Halle, Alan Thomas, Michael Armacost, Timothy Dalton, Xiaochun Chen, Scott Bukofsky, Oliver Genz, Zhijian Lu, Shahid Butt, Zheng Chen, Richard Ferguson, Eric Coker, Robert Leidy, Qinghuang Lin, Arpan Mahorowala, Katherina Babich, Karen Petrillo, Marie Angelopoulos, Mark Ignatowicz, Bang Bui

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435797

KEYWORDS: Etching, Photomasks, Dielectrics, Lithography, Oxides, Thin films, Silicon, Reactive ion etching, Photoresist processing, Scanning electron microscopy

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Proceedings Article | 5 July 2000 Paper

Image shortening and process development in BEOL lithography

Ronald DellaGuardia, Dennis Warner, Zheng Chen, Martin Stetter, Richard Ferguson, Anne McGuire, Karen Badger

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388928

KEYWORDS: Image processing, Lithography, Photomasks, Printing, Phase shifts, Critical dimension metrology, Back end of line, Lithographic illumination, Distance measurement, Semiconductors

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Proceedings Article | 25 June 1999 Paper

X-ray mask defect repair optimization

Zheng Chen, Steven Nash, Azalia Krasnoperova, Chet Wasik

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351119

KEYWORDS: Photomasks, Opacity, X-rays, Printing, Gold, Bridges, X-ray lithography, Ion beams, Lithography, Ions

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Proceedings Article | 1 September 1998 Paper

High-aspect-ratio x-ray lithography for magnetic head fabrication

Zheng Chen, Nikolai Krasnoperov, Steven Gearhart, Yuli Vladimirsky, Franco Cerrina

Proceedings Volume 3512, (1998) https://doi.org/10.1117/12.324053

KEYWORDS: Photomasks, Polymethylmethacrylate, Head, X-ray lithography, Magnetism, X-rays, Gold, Photoresist processing, Electron beam lithography, Plating

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Proceedings Article | 5 June 1998 Paper

0.1-um high-aspect-ratio pattern replication and linewidth control

Zheng Chen, Yuli Vladimirsky, Franco Cerrina, Barry Lai, Wenbing Yun, Efim Gluskin

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309620

KEYWORDS: Gold, Photomasks, Reactive ion etching, X-rays, Electroplating, Polymethylmethacrylate, Etching, Plating, Photoresist materials, X-ray lithography

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Proceedings Article | 7 July 1997 Paper

E-beam-induced distortions on SiN x-ray mask membrane

Nikolai Krasnoperov, Zheng Chen, Franco Cerrina

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275949

KEYWORDS: Polymethylmethacrylate, Photomasks, Electron beam lithography, X-rays, Capacitors, X-ray lithography, Chlorine, Mask making, Photoresist processing, Metrology

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Proceedings Article | 7 July 1997 Paper

X-ray phase mask: nanostructures

Zheng Chen, Quinn Leonard, Mumit Khan, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275775

KEYWORDS: Photomasks, X-rays, X-ray lithography, Polymethylmethacrylate, Phase shifts, Semiconducting wafers, Nanostructures, Silicon carbide, Lithography, Silicon

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Proceedings Article | 27 May 1996 Paper

New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile

Oleg Makarov, Zheng Chen, Azalia Krasnoperova, Franco Cerrina, Vadim Cherkashin, Alexander Poleshchuk, Voldemar Koronkevich

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240477

KEYWORDS: Photomasks, X-rays, X-ray lithography, Diffractive optical elements, Lenses, Diffraction, Modulation, Binary data, Polymethylmethacrylate, Computer generated holography

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Proceedings Article | 25 September 1995 Paper

Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia Krasnoperova, Zheng Chen, Franco Cerrina, Enzo Di Fabrizio, Massimo Gentili, Wenbing Yun, Barry Lai, Efim Gluskin

Proceedings Volume 2516, (1995) https://doi.org/10.1117/12.221670

KEYWORDS: Gold, Photoresist materials, X-ray lithography, X-rays, Photomasks, Lithography, Polymethylmethacrylate, Electroplating, Optical fabrication, Zone plates

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Proceedings Article | 19 May 1995 Paper

Effect of the high-contrast-mask sidewall slope on deep x-ray lithography

Zheng Chen, Azalia Krasnoperova, Yueqi Zhu, Franco Cerrina

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209171

KEYWORDS: Photomasks, X-ray lithography, Polymethylmethacrylate, Gold, X-rays, Image processing, Photoresist processing, Image acquisition, Absorption, Micromachining

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Showing 5 of 17 publications

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