Bit-patterned media (BPM) is a candidate for high-density magnetic recording media. Directed self-assembly
(DSA) is expected to be a solution for the fabrication process of high-density BPM. A BPM with 20 nm-pitch
dot pattern is fabricated. A 100 nm-pitch triangle lattice dot pattern, which is fabricated by EB lithography, is
used as a guide post to order PS-PDMS self-assembled diblock co-polymer with 20 nm pitch. Dot-pitch
fluctuation and linearity of pseudo dot tracks are estimated. The standard deviation of the dot-pitch variation
including the post guide is 8% of the self-assembled dot pitch. The dot-position deviation is estimated to be
about 8% of the pseudo dot track pitch. In both cases, variation of the size and pitch of the post guides is
found to increase the dot-pitch fluctuation and dot-position deviation from pseudo dot-track.
Bit patterned media (BPM) is a promising candidate for next-generation magnetic recording media beyond 2.5 Tb/in2.
To realize such high-density patterned media, directed self-assembling (DSA) technology is a possible solution to form
fine dots. In order to read and write magnetic signals on a magnetic dot of magnetic media, the position of magnetic dots
must be controlled. We examined ordering of directed self-assembly of diblock copolymer dots with a variety of prepatterned
guides in some conditions and evaluated the ordering of the dots by using Delaunay triangulation and Voronoi diagram. Applying the optimized conditions, we obtained highly controlled dot pattern suitable for magnetic recording media.
Bit patterned media (BPM) is a promising candidate for high-density magnetic recording media beyond 2.5 Tb/in2. To
realize such a high-density BPM, directed self-assembling (DSA) technology is a possible solution. On the other hand,
from the viewpoint of low-cost production, nanoimprint lithography is a promising process for the mass-production of
such a high-density BPM. We examine the replication of the BPM etching mask by UV nanoimprint process. At first, the
BPM silicon master mold consisting of servo pattern with dot array is made by the DSA method using PS-PDMS. For
the 30-nm pitch corresponding to the density of 2.5 Tb/in2, the nickel stamper is replicated from the silicon master mold
by electroplating. The etching mask is transcribed by the UV nanoimprint process with the transparent mold replicated
from the nickel mother stamper. On the other hand, as for the DSA-BPM pattern of 17-nm pitch corresponding to the
density of 2.5 Tb/in2, we adopt an alternative process and confirm the replication possibility.
Bit patterned media (BPM) is a candidate for high-density magnetic recording. One of the critical issues
concerning high-density BPM is a fine pattern drawing process for an etching mask. A self-assembled polymer is a
solution for the fine etching mask material realizing a density of more than several Tb/in2. The remaining issue
concerning the self-assembled mask is servo pattern formation with the self-assembled dots. This paper reports
fabrication of a ridge-and-groove servo pattern with arrays of
35nm-pitch self-assembled CoPt magnetic dots and signal
properties of the servo pattern are estimated. Dot size and alignment was not uniform in the servo pattern because of the
deviation of the guide width and the taper at the guide edge. This feature will result in a distorted servo signal profile.
However, the numerical estimation based on the fabricated servo patterns revealed that the linearity of the position error
signal was fairly good. The distortion in waveform does not degrade the phase information of the servo signal, provided
the guide is positioned with high precision. Thus the
ridge-and-groove servo is suitable for self-assembled bit patterned
media.
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