KEYWORDS: System on a chip, Optical proximity correction, Data conversion, Inspection, Metals, Manufacturing, Electronics, Vestigial sideband modulation, Parallel processing, Software development
As the feature size of LSI becomes smaller, the increase of mask manufacturing cost is becoming critical. Association of
Super-Advanced Electronics Technologies (ASET) started a 4-year project aiming at the reduction of mask
manufacturing cost and TAT by the optimization of MDP, mask writing, and mask inspection in 2006 under the
sponsorship of New Energy and Industrial Technology Development Organization (NEDO). In the project, the
optimization is being pursued from the viewpoints of "common data format", "pattern prioritization", "repeating
patterns", and "parallel processing" in MDP, mask writing, and mask inspection. In the total optimization, "repeating
patterns" are applied to the mask writing using character projection (CP) and efficient review in mask inspection. In this
paper, we describe a new method to find repeating patterns from OPCed layout data after fracturing. We found that using
the new method efficient extraction of repeating patterns even from OPCed layout data is possible and shot count of
mask writing decreases greatly.
As the feature size of LSI becomes smaller, the increase of mask manufacturing cost is becoming critical. Association of
Super-Advanced Electronics Technologies (ASET) started a 4-year project aiming at the reduction of mask
manufacturing cost and TAT by the optimization of MDP, mask writing, and mask inspection in 2006 under the
sponsorship of New Energy and Industrial Technology Development Organization (NEDO) [1]. In the project, the
optimization is being pursued from the viewpoints of "common data format", "pattern prioritization", "repeating
patterns", and "parallel processing" in MDP, mask writing, and mask inspection. In the total optimization, "repeating
patterns" are applied to the mask writing using character projection (CP) and efficient review in mask inspection. In this
paper, we describe a new method to find repeating patterns from OPCed layout data after fracturing. We found that using
the new method efficient extraction of repeating patterns even from OPCed layout data is possible and shot count of
mask writing decreases greatly.
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