Mr. Yosef Avrahamov Profile

Yosef Avrahamov

Product Marketing Manager at KLA Israel

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Author

Publications (6)

Proceedings Article | 6 April 2012 Paper

Photoresist qualification using scatterometry CD

Roie Volkovich, Yosef Avrahamov, Guy Cohen, Patricia Fallon, Wenyan Yin

Proceedings Volume 8324, 832437 (2012) https://doi.org/10.1117/12.918392

KEYWORDS: Photoresist materials, Semiconducting wafers, Critical dimension metrology, Scatterometry, Semiconductors, Optical lithography, Photoresist processing, Reflectometry, Lithography, Chemistry

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Proceedings Article | 24 March 2009 Paper

Automated overlay recipe setup in high-volume manufacturing: improving performance, efficiency, and robustness

Christian Sparka, Anna Golotsvan, Yosef Avrahamov, Wolfgang Sitzmann, David Tien

Proceedings Volume 7272, 727232 (2009) https://doi.org/10.1117/12.814338

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Optical alignment, Time metrology, Databases, High volume manufacturing, Semiconductors, Intelligence systems, Image processing

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Proceedings Article | 5 April 2007 Paper

45nm design rule in-die overlay metrology on immersion lithography processes

Yu-Hao Shih, George KC Huang, Chun-Chi Yu, Mike Adel, Chin-Chou Kevin Huang, Pavel Izikson, Elyakim Kassel, Sameer Mathur, Chien-Jen Huang, David Tien, Yosef Avrahamov

Proceedings Volume 6518, 651831 (2007) https://doi.org/10.1117/12.711754

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Immersion lithography, Statistical modeling, Optical lithography, Data modeling, Optical alignment, Reticles

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Proceedings Article | 24 March 2006 Paper

AIM technology for nonvolatile memories microelectronics devices

Pier Luigi Rigolli, Laura Rozzoni, Catia Turco, Umberto Iessi, Marco Polli, Elyakim Kassel, Pavel Izikson, Yosef Avrahamov

Proceedings Volume 6152, 61524C (2006) https://doi.org/10.1117/12.656485

KEYWORDS: Overlay metrology, Metrology, Image segmentation, Front end of line, Semiconducting wafers, Chemical mechanical planarization, Metals, Lithography, Scanning electron microscopy, Scanners

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Proceedings Article | 24 March 2006 Paper

Lithography rework reduction and improved process control using AIM targets on aluminum layers in the high-volume production of 110-nm DRAM devices

Detlef Hofmann, Frank Rabe, Yosef Avrahamov, Christian Sparka

Proceedings Volume 6152, 61522B (2006) https://doi.org/10.1117/12.653360

KEYWORDS: Aluminum, Overlay metrology, Process control, Etching, Semiconducting wafers, Data modeling, Lithography, Metrology, Sputter deposition, Metals

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Proceedings Article | 10 May 2005 Paper

Overlay measurement accuracy verification using CD-SEM and application to the quantification of WIS caused by BARC

Laurent Lecarpentier, Vincent Vachellerie, Elyakim Kassel, Yosef Avrahamov, Chin-Chou Huang, Frank Felten, Marco Polli, Aurelien Feneyrou, Philippe Thony, Stephane Guillot

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.610662

KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Reticles, Scanning electron microscopy, Error analysis, Metrology, Detection and tracking algorithms, Scanners, Inspection

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Showing 5 of 6 publications

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