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Dr. Yih-Cheng Shih
at Lam Research Taiwan Training Ctr
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Publications (1)
Proceedings Article | 17 May 1994 Paper
Application of subresolution phase-shift mask with G-line stepper for sub-half-micrometer gate GaAs circuits
Yih-Cheng Shih, Joseph Garofalo
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175454
KEYWORDS: Photomasks, Gallium arsenide, Phase shifts, Metals, Scanning electron microscopy, Semiconducting wafers, Phase shifting, Mask making, Photoresist processing, Surface plasmons
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