Mr. Yasutaka Morikawa Profile

Yasutaka Morikawa

at Evolving Nano-process Infrastructure Development Ctr., Inc.

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Publications (2)

Proceedings Article | 26 March 2019 Presentation + Paper

Influence of mask line width roughness on programmed pattern defect printability

Takeshi Yamane, Yasutaka Morikawa, Takashi Kamo

Proceedings Volume 10957, 109570M (2019) https://doi.org/10.1117/12.2515145

KEYWORDS: Photomasks, Line width roughness, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Edge roughness, Defect inspection

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Proceedings Article | 26 March 2019 Presentation + Paper

Mask 3D effect reduction and defect printability of etched multilayer EUV mask

Takashi Kamo, Takeshi Yamane, Yasutaka Morikawa, Susumu Iida, Takayuki Uchiyama, Shunko Magoshi, Satoshi Tanaka

Proceedings Volume 10957, 109571C (2019) https://doi.org/10.1117/12.2515273

KEYWORDS: Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Lithographic illumination, Line width roughness, Line edge roughness

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