Yasuki Kimura
at HOYA Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 June 2013 Paper
Yasuki Kimura, Takao Kubota, Kenji Kouno, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara
Proceedings Volume 8701, 87010H (2013) https://doi.org/10.1117/12.2028333
KEYWORDS: Photomasks, Data modeling, Model-based design, Process modeling, Critical dimension metrology, Mask making, Computer simulations, Logic, Lithography, Electron beams

Proceedings Article | 8 November 2012 Paper
Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara
Proceedings Volume 8522, 85221I (2012) https://doi.org/10.1117/12.958601
KEYWORDS: Photomasks, Data modeling, Model-based design, Mask making, Logic, Immersion lithography, Electron beams, Vestigial sideband modulation, SRAF, Modulation

Proceedings Article | 30 June 2012 Paper
Sergey Babin, Sergey Borisov, Yasuki Kimura, Kenji Kono, Vladimir Militsin, Ryuuji Yamamoto
Proceedings Volume 8441, 844112 (2012) https://doi.org/10.1117/12.978924
KEYWORDS: Electron beam lithography, Photomasks, Data modeling, Calibration, Double patterning technology, Software development, Mask making, Electron beams, Distortion, Etching

SPIE Journal Paper | 1 April 2005
JM3, Vol. 4, Issue 02, 023004, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898043
KEYWORDS: Photomasks, Phase shifts, Monochromatic aberrations, Reticles, Diffraction, Critical dimension metrology, Cadmium, Scattering, Optical lithography, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Navab Singh, Moitreyee Mukherjee-Roy, Sohan Mehta, Hideki Suda, Takao Kubota, Yasuki Kimura, Hiroshi Kinoshita
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547729
KEYWORDS: Photomasks, Optical lithography, Etching, Modulation, Phase shifts, Lithography, Binary data, Scanners, Manufacturing, Scanning electron microscopy

Showing 5 of 11 publications
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