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Dr. Yaojun Du
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Publications (4)
Proceedings Article | 20 March 2018 Presentation + Paper
A model-based approach for the scattering-bar printing avoidance
Yaojun Du, Liang Li, Jingjing Zhang, Feng Shao, Christian Zuniga, Yunfei Deng
Proceedings Volume 10587, 105870Q (2018) https://doi.org/10.1117/12.2295451
KEYWORDS: Printing, Scattering, Data modeling, Optical proximity correction, Semiconducting wafers, Calibration, Binary data, Critical dimension metrology, Model-based design, Wafer-level optics
Proceedings Article | 24 March 2017 Paper
The pattern-matching based OPC approach for preemptively fixing the weak points
Proceedings Volume 10147, 101471H (2017) https://doi.org/10.1117/12.2257898
KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Computational lithography, Phase modulation, Lithography, SRAF, Double patterning technology, Logic, Visualization
Proceedings Article | 18 March 2015 Paper
The comparison of various strategies of setting up an OPC repair flow with respect to process window constraints
Yaojun Du, Qing Yang
Proceedings Volume 9426, 94261W (2015) https://doi.org/10.1117/12.2085306
KEYWORDS: Optical proximity correction, Cadmium, Critical dimension metrology, Semiconducting wafers, Photomasks, Manufacturing, Lithography, Scanners, Optics manufacturing, Wafer-level optics
Proceedings Article | 18 March 2015 Paper
OPC solution by implementing fast converging methodology
Proceedings Volume 9426, 94261V (2015) https://doi.org/10.1117/12.2085304
KEYWORDS: Optical proximity correction, Semiconducting wafers, Detection and tracking algorithms, Semiconductor manufacturing, Lithography, Etching, Resolution enhancement technologies, Printing, Model-based design, Photomasks
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