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Yang-Hun Yoon
at Pohang Accelerator Lab.
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Publications (1)
Proceedings Article | 10 April 2024 Poster
EUV sensitivity and PEB stability of Sn-12 clusters for EUVL
Yeo Kyung Kang, Heeju Kim, Sun Jin Lee, Dong-Seok Oh, Yang-Hun Yoon, Chang-Jun Kim, Geun Young Yeom, Chan-Cuk Hwang, Myung-Gil Kim
Proceedings Volume 12957, 129572D (2024) https://doi.org/10.1117/12.3023154
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Tin, Lithography, Nanostructures, Manufacturing, Light absorption, Industry, Etching
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