Teledyne-e2v’s sensors and wafer-scale processing are widely used for high performance imaging across soft X-ray and optical bands. In the ultraviolet spectral range, the combination of short absorption lengths (below 10 nm) and high reflectance (up to 75 %) can strongly limit the quantum efficiency. Direct detection capability relies on back-illumination and back-thinning processes to be applied to a sensor to remove dead layers from the optical path. As the thinning process leaves an unacceptably thick backside potential well as well as a highly reflective surface, in-house ultraviolet-specific (e.g. for WUVS) or third-party processes (e.g. delta-doping for FIREBall) are required. We have calibrated Teledyne-e2v’s latest in-house wafer-scale proprietary processes with monochromatic synchrotron radiation over a wide spectral range in the ultraviolet domain (λ=40 nm – 400 nm) at the Metrology Light Source of the Physikalisch-Technische Bundesanstalt. The first process is a shallow p+ implantation that permits the thinning of the backside potential well. It is available in two different levels: basic and enhanced. The second type of enhancement is a specific anti-reflective coating to increase the back-surface transmittance for distinct spectral ranges. In this paper, we will present comparative quantum efficiency calibration of both passivation stages and of two different ultraviolet specific anti-reflective coatings (applied on enhanced passivation devices). Also, their stability after intense ultraviolet illumination will be shown. These measurements will permit Teledyne-e2v to extend the quantum efficiency data of their most recent processes across the soft X-ray to near-infrared spectrum.
Compound semiconductor mid-wavelength infrared photodetectors operating at room temperature are the sensors of choice for demanding applications such as thermal imaging, heat-seeking, and spectroscopy. However, those detectors suffer from high dark current and thus normally require additional cooling accessories. In this work, we argue for the fundamental feasibility that by using nanowires coupled with plasmonic nano-antennae as photoabsorbers, the dark current can be largely reduced compared with typical planar devices. To demonstrate the idea, we simulate the device characteristics, such as dark current, responsivity, and detectivity, of InAsSb0.07 nanowire photodetectors, and compare those properties with the best research InAs photovoltaic diodes. The results show that the designed nanowire detectors offer over one-order lower dark current and enable a peak detectivity of 7.0×1010 cm Hz1/2W-1 at 3.5 μm. We believe this work will provide a guidance to the design of nanowire-based MWIR photodetectors and stimulate additional experimental and theoretical research studies.
In0.53Ga0.47As/InP single photon avalanche detectors (SPADs) have a high photon detection efficiency in the near-IR, however the dark count rate is prohibitively high at room temperature. A nanowire-based In0.3Ga0.7As/GaAs SPAD can significantly reduce the DCR through a nearly three order of magnitude reduction in bulk InGaAs volume, as well as by reducing the indium composition for operation at 1064 nm. As a first step, we have successfully grown axial InGaAs/GaAs heterostructures using catalyst-free selective-area epitaxy. We will present the electrical characterization of a vertically oriented nanowire array InGaAs/GaAs SPADs operating at 1064 nm and use 3-dimensional modeling to aid in the analysis.
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