KEYWORDS: Control systems, Feedback control, Photoresist materials, Temperature sensors, Control systems design, Manufacturing, Coating, Statistical analysis, Semiconductors, Process control
Viscosity of photoresist is an important product parameter because it determines film thickness during spin coating.
Producers of photoresist, therefore, have established manufacturing procedures which require that fluid viscosity be
measured several times during production to ensure product quality. Periodic samples are taken off-line to an analytical
laboratory where viscosity is measured under controlled conditions. However, off-line measurements, interrupt
production, engage valuable human resources, and fail to provide adequate process feedback. This paper describes the
implementation of an automatic viscosity-controlled production process of photoresist using a unique in-line viscometer.
The automated photoresist production process increases throughput and improves product quality. With sufficient
accuracy and repeatability of the measurements, it is now possible to correlate and predict film thickness with viscosity
values taken during photoresist production.
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