Ms. Won Sun Kim Profile

Won Sun Kim

Research Staff Member at SAMSUNG Electronics Co Ltd

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Author

Publications (5)

Proceedings Article | 23 September 2009 Paper

Inspection of complex OPC patterns for 4x node and beyond

Sang Hoon Han, Wonil Cho, Won-Sun Kim, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho

Proceedings Volume 7488, 74882S (2009) https://doi.org/10.1117/12.830032

KEYWORDS: Inspection, SRAF, Optical proximity correction, Artificial intelligence, Defect detection, Semiconducting wafers, Photomasks, Reticles, Model-based design, Image resolution

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Proceedings Article | 23 September 2009 Paper

Aerial plane inspection for advanced photomask defect detection

Won Sun Kim, Jin Hyung Park, Dong Hoon Chung, Chan Uk Jeon, Han Ku Cho, Trent Hutchinson, Oscar Lee, William Huang, Aditya Dayal

Proceedings Volume 7488, 74882Q (2009) https://doi.org/10.1117/12.830139

KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection

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Proceedings Article | 11 May 2009 Paper

Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture

Won-Sun Kim, Dong-Hoon Chung, Chan-Uk Jeon, HanKu Cho, William Huang, John Miller, Gregg Inderhees, Becky Pinto, Jiuk Hur, Kihun Park, Jay Han

Proceedings Volume 7379, 73791C (2009) https://doi.org/10.1117/12.824289

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Wafer inspection, Reticles, SRAF, Optical proximity correction, Lithography, Contamination, Image resolution

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Proceedings Article | 23 March 2009 Paper

Requirements of the inspection for double patterning technology reticles

Wonil Cho, Won-Sun Kim, Sung-Joon Sohn, Sunpyo Lee, Jihyeon Choi, Yonghoon Kim, HanKu Cho

Proceedings Volume 7272, 72721T (2009) https://doi.org/10.1117/12.814101

KEYWORDS: Inspection, Reticles, Double patterning technology, Defect detection, Critical dimension metrology, Ear, Semiconducting wafers, Photomasks, Defect inspection, Radon

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Proceedings Article | 14 May 2007 Paper

Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node

Won Sun Kim, Jin Hyung Park, Dong-Hoon Chung, Sang-Gyun Woo

Proceedings Volume 6607, 660717 (2007) https://doi.org/10.1117/12.728956

KEYWORDS: Inspection, Lamps, Photomasks, Deep ultraviolet, Defect detection, SRAF, Particles, Defect inspection, Manufacturing, Resolution enhancement technologies

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