This study introduces a groundbreaking approach to micro/nanoscale patterning by synergistically combining Two- Photon Polymerization (TPP) with Digital Micro Mirror Device (DMD) technology. By leveraging a femtosecond laser and employing a novel grayscale lithography method via the DMD, we have significantly optimized both the throughput and resolution of patterning processes beyond the traditional diffraction limit. Our methodology enables the precise fabrication of complex 3D nano-structures as well as intricate 2D patterns, addressing long-standing throughput and resolution challenges in TPP. Through simulations of the Point Spread Function (PSF) and meticulous adjustments to the DMD's grayscale modulation, we achieved uniform light intensity and high-resolution patterning, demonstrating the potential of this approach to revolutionize micro and nanoscale fabrication. The successful integration of DMD-enhanced femtosecond laser patterning with TPP opens new avenues for the development of advanced devices across various fields, from biomedical engineering to microelectronics, setting a new benchmark for precision and efficiency in digital patterning technologies.
Patterning liquid metal is a promising electrode material for soft electronics. In order to obtain controllable and fine liquid metal patterning, in this study, a superhydrophobic PDMS surface was fabricated using a femtosecond laser to adhere to liquid metal circuits selectively. A trapezoidal hierarchical micro/nanostructure was fabricated as the surface of PDMS was ablated by laser irradiation at a distance of 30 μm. As a result, the roughness of the surface increases, and the liquid metal adheres easily to the non-laser-treated area, but the liquid metal does not adhere to the laser-treated area. This method made various high-resolution liquid metal patterns with a line width of at least 40 μm. This method is fast, simple, inexpensive, does not require additional vacuum equipment, and is expected to be highly applicable, such as fabricating wearable devices, soft electronics.
A LED light coupler is designed with rigorous geometrical optics analysis for coupling light from a mini side white LED
of 0.6mm height, the thinnest commercially available LED, into to a very thin (~0.3mm) light guide on the edge side.
The ultra thin thickness of the light guide limits the application of conventional LED coupling due to short coupling
efficiency. Furthermore the polychromatic spectral band of the LED excludes the use of diffractive gratings which were
proposed for a nearly monochromatic LED coupling to a thin light guide. The coupler is essentially comprised of a
collimator and a concentrator lens. The coupler first collimates the light from the LED and then concentrates the
collimated light into the light guide. The exit surface of the coupler is additionally textured to have micro patterns in
order to control the radiance profile. The coupling efficiency is improved from 50%~60% without any couplers to 86%
with the proposed LED coupler.
KEYWORDS: Near field scanning optical microscopy, Nanostructures, Photoresist materials, Optical microscopes, Nanoprobes, Helium cadmium lasers, Microfabrication, Near field optics
Nanopatterning on the surface of a spin-coated photoresist using a near-field scanning optical microscope (NSOM) is investigated. A cantilever type nanoprobe whose aperture diameter is approximately 100 nm is installed on the NSOM to produce the nanopatterns. The optical near-field at the tip of the nanoprobe is produced by focusing the light from a He-Cd laser on the entrance side of the nanoprobe. The variation of pattern size are examined with respect to process parameters such as laser beam power, scan speed of the nanoprobe, and thickness of the coated photoresist. The linewidth of nanopatterns reduces for decreasing laser power and increasing scan speed. Using this method, about 200 nm size nanopatterns are produced. Fabrication of a two-dimensional nanopattern of arbitrary shape is demonstrated.
Laser direct writing (LDW) process is developed using 3-rd harmonic Diode Pumped Solid State Laser (DPSSL) with the near UV wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and optical polymer property to get the optimal conditions. This process could be applied to fabricate a single-mode waveguide without expensive mask projection method. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8.4μm width and 7.5μm height. Propagation loss of planar waveguide was 1.42 dB/cm at wavelength of 1,550 nm.
A layer-by-layer laser ablation process of polymers with a diode-pumped solid state (DPSS) third harmonic Nd:YVO4 laser with wavelength of 355 nm is developed to fabricate a 3-D microshape. Polymer fabrication using DPSS lasers has some advantages compared with the conventional polymer ablation process using KrF and ArF lasers with 248 and 193 nm wavelengths, such as pumping efficiency and low maintenance fees. This method also makes it possible to fabricate 2-D patterns or 3-D shapes rapidly and cheaply because CAD/CAM software and precision stages only are used without complex projection mask techniques. The photomachinability of polymers is highly influenced by laser wavelength and its own chemical structure. So the optical characteristics of polymers for a 355-nm laser source are investigated experimentally and theoretically. The photophysical and photochemical parameters such as laser fluence, focusing position, and ambient gas are considered to reduce the plume effect, which induces the redeposited debris on the surface of a substrate. Thus, the process parameters are tuned to optimize gaining precision surface shape and quality. This direct photomachining technology using DPSS lasers could be expected to manufacture the prototype of microdevices and be the mold for the laser-LIGA process.
Multiple pulse laser ablation of polymer is performed with DPSS (Diode Pumped Solid State) 3rd harmonic Nd:YVO4 laser (355 nm) in order to fabricate three-dimensional micro components. Here we considered mechanistic aspects of the interaction between UV laser and polymer to obtain optimum process conditions for maskless photomachining using DPSSL. The photo-physical and photochemical parameters such as laser wavelength and optical characteristics of polymers are investigated by experiments to reduce plume effect, which induce the re-deposited debris on the surface of substrate. In this study, LDST (laser direct sculpting technique) are developed to gain various three-dimensional shape with size less than 500 micrometer. Main process sequences are from rapid prototyping technology such as CAD/CAM modeling of products, machining path generation, layer-by-layer machining, and so on. This method can be applied to manufacture the prototype of micro device and the polymer mould for mass production without expensive mask fabrication.
Micromachining using the DPSS 3rd Harmonic Laser (355nm) has outstanding advantages as a UV source in comparison with Excimer lasers in various aspects such as maintenance cost, maskless machining, high repetition rate and so on. It also has the greater absorptivity of many materials in contrast to other IR sources.
In this paper, the process for micro-drilling of through and blind hope in Cu/PI/Cu substrate with the UV DPSSL and a scanning device is investigated by both experimental and numerical methods. It is known that there is a large gap between the ablation threshold of copper and that of PI. We use the multi path for through hole with high energy density and we use Archimedes spiral path for blind hole with different energy densities to ablate different material. Furthermore, Matlab simulations considering the energy threshold of material is performed to anticipate the ablation shape according to the duplication of pulse, and FEM thermal analysis is used to predict the ablation depth of copper.
This study would be widely applicable to various laser micromachining applications including through and blind hole micro-drilling of PCB, and micromachining of semiconductor components, medical parts and printer nozzles amongst others.
The feasibility of laser ablation in micro-machining of 3D structure of MEMS (Micro Electro Mechanical Systems) parts, specifically micro optics was studied in this paper. The micro-machining characteristics of polymer such as etching rate vs. energy fluence, number of pulse are investigated experimentally. The threshold energy density of polyurethane is about 30 mJ/cm2 and ablated depth per pulse can be precisely controlled in the range of 0.1-0.8μm by the attenuation of energy fluence. By mask moving technique, the micro prism, cylindrical lens and inclined surface were fabricated. These 3D structures can be used as master in electro-plating mold. This paper also summarized the work on the development of a simulation program for modeling the process of machining quasi-three dimensional shapes with the excimer laser beam on a constant moving polymer. Relatively simple masks of rectangle, triangle and half circle shape are considered. The etching depth is calculated by considering the number of laser pulses and the wavelength of laser beam irradiated on the various specimen surface such as PMMA, polyurethane and PI. It was found that similar shapes as experimental results, mask shape was designed to gain-lens surface which we want. As another method to manufacture micro lens the mask is made circular type and rotated during laser beam illumination. Opened mask area and scanning speed determine the surface shape of lens. Precise control of various parameters is admitted to fabricate micro optics.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.