Mr. Winfried M. Kaiser Profile

Winfried M. Kaiser

Retired at Carl Zeiss SMT GmbH

SPIE Involvement:

Conference Program Committee | Author

Publications (29)

Proceedings Article | 22 February 2021 Presentation

Presentation

High-NA EUV lithography exposure tool: key advantages and program progress

Jan Van Schoot, Sjoerd Lok, Eelco Van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler

Proceedings Volume 11609, 1160905 (2021) https://doi.org/10.1117/12.2583640

KEYWORDS: Extreme ultraviolet lithography, Sensors, Scanners, Projection systems, Printing, Optical lithography, Mirrors, Lens design, High volume manufacturing, Device simulation

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Proceedings Article | 7 January 2021 Presentation + Paper

Presentation + Paper

High-NA EUV lithography exposure tool: advantages and program progress

Jan Van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser

Proceedings Volume 11517, 1151712 (2021) https://doi.org/10.1117/12.2572932

KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Printing, Optical lithography, Device simulation, Projection systems, Buildings

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Proceedings Article | 23 March 2020 Paper

Paper

High-NA EUV lithography exposure tool: program progress

Jan Van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, Joerg Zimmerman, Paul Graeupner, Lars Wischmeier, Peter Kuerz, Winfried Kaiser

Proceedings Volume 11323, 1132307 (2020) https://doi.org/10.1117/12.2551491

KEYWORDS: Photomasks, Line width roughness, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Scanners, Extreme ultraviolet, Photoresist materials, Optics manufacturing, Stochastic processes

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Proceedings Article | 23 March 2020 Paper

Paper

High-NA EUV lithography optics becomes reality

Lars Wischmeier, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Jan van Schoot, Joerg Mallmann, Joost de Pee, Judon Stoeldraijer

Proceedings Volume 11323, 1132308 (2020) https://doi.org/10.1117/12.2543308

KEYWORDS: Light sources and illumination, Lithographic illumination, Mirrors, Metrology, EUV optics, Projection systems, Optics manufacturing, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 16 October 2019 Presentation

Presentation

High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation)

Jan Van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, Joerg Zimmermann, Paul Graeupner, Peter Kuerz, Winfried Kaiser

Proceedings Volume 11147, 1114710 (2019) https://doi.org/10.1117/12.2538325

KEYWORDS: Extreme ultraviolet lithography, Photomasks, High volume manufacturing, Scanners, Lens design, Sensors, Thermography, Pellicles

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Proceedings Article | 16 October 2019 Presentation

Presentation

Advancing EUV lithography optics (Conference Presentation)

Heiko Feldmann, Olaf Conradi, Paul Graeupner, Jan van Schoot, Peter Kuerz, Winfried Kaiser

Proceedings Volume 11147, 1114704 (2019) https://doi.org/10.1117/12.2538927

KEYWORDS: Extreme ultraviolet lithography, EUV optics, Scanners, Imaging systems, Projection systems, Lithographic illumination, Optical design, Double patterning technology, Extreme ultraviolet, Mirrors

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Proceedings Article | 29 August 2019 Paper

Paper

High-NA EUV lithography: pushing the limits

C. Zahlten, P. Gräupner, J. van Schoot, P. Kürz, J. Stoeldraijer, W. Kaiser

Proceedings Volume 11177, 111770B (2019) https://doi.org/10.1117/12.2536469

KEYWORDS: Mirrors, Extreme ultraviolet, Metrology, Semiconducting wafers, Imaging systems, Extreme ultraviolet lithography, Photomasks, Control systems, Scanners, Lithography

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Proceedings Article | 14 March 2019 Presentation

Presentation

High-NA EUV lithography exposure tool progress

Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, Joerg Zimmermann, Peter Kuerz, Marco Pieters, Winfried Kaiser

Proceedings Volume 10957, 1095707 (2019) https://doi.org/10.1117/12.2515205

KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Polarization, Polarization control

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Proceedings Article | 12 October 2018 Presentation

Presentation

High-NA EUV lithography exposure tool progress (Conference Presentation)

Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Hans Meiling, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Erik Loopstra, Bernhard Kneer, Sascha Migura

Proceedings Volume 10809, 108090Z (2018) https://doi.org/10.1117/12.2502894

KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Polarization, Polarization control

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Proceedings Article | 19 March 2018 Presentation

Presentation

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura

Proceedings Volume 10583, 105830R (2018) https://doi.org/10.1117/12.2295800

KEYWORDS: Extreme ultraviolet lithography, Scanners, Imaging systems, Manufacturing, Lens design, Sensors, Optical proximity correction, Modeling, Photomasks, Lithography

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SPIE Journal Paper | 30 October 2017

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Jan van Schoot, Eelco van Setten, Gijsbert Rispens, Kars Troost, Bernhard Kneer, Sascha Migura, Jens Timo Neumann, Winfried Kaiser

JM3, Vol. 16, Issue 04, 041010, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041010

KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics

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Proceedings Article | 16 October 2017 Presentation + Paper

Presentation + Paper

High-NA EUV lithography enabling Moore’s law in the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura, Jens Timo Neumann

Proceedings Volume 10450, 104500U (2017) https://doi.org/10.1117/12.2280592

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Mirrors, Reticles, Projection systems, Optical design, Imaging systems, Extreme ultraviolet

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Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura

Proceedings Volume 10143, 101430G (2017) https://doi.org/10.1117/12.2261079

KEYWORDS: Extreme ultraviolet lithography, Scanners, Manufacturing, Lens design, Sensors, Optical proximity correction, Modeling, Photomasks, Semiconducting wafers, Extreme ultraviolet, Reflectivity, EUV optics, Lithography, Projection systems

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Proceedings Article | 18 March 2016 Paper

Paper

EUV high-NA scanner and mask optimization for sub-8nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser

Proceedings Volume 9776, 97761I (2016) https://doi.org/10.1117/12.2220150

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Reticles, Scanners, Semiconducting wafers, Source mask optimization, Wafer-level optics, Lithography, Imaging systems, Extreme ultraviolet, Neodymium, Ions

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Proceedings Article | 16 November 2015 Paper

Paper

EUV High-NA scanner and mask optimization for sub 8 nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser

Proceedings Volume 9635, 963503 (2015) https://doi.org/10.1117/12.2202258

KEYWORDS: Extreme ultraviolet lithography, Scanners, Photomasks, Reticles, Image resolution, Lithography, Wafer-level optics, Semiconducting wafers, Source mask optimization, EUV optics, Imaging systems, Nanoimprint lithography, Ions, Neodymium

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Proceedings Article | 4 September 2015 Paper

Paper

Anamorphic high-NA EUV lithography optics

Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser, Jan van Schoot

Proceedings Volume 9661, 96610T (2015) https://doi.org/10.1117/12.2196393

KEYWORDS: Photomasks, Reticles, Extreme ultraviolet lithography, Semiconducting wafers, Projection systems, Mirrors, Lithography, EUV optics, Wafer-level optics, Lithographic illumination

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Proceedings Article | 16 March 2015 Paper

Paper

EUV lithography optics for sub-9nm resolution

Bernhard Kneer, Sascha Migura, Winfried Kaiser, Jens Timo Neumann, Jan van Schoot

Proceedings Volume 9422, 94221G (2015) https://doi.org/10.1117/12.2175488

KEYWORDS: Reticles, Photomasks, Projection systems, Extreme ultraviolet lithography, Diffraction, Semiconducting wafers, Mirrors, EUV optics, Extreme ultraviolet, Lithography

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Proceedings Article | 16 March 2015 Paper

Paper

Imaging performance of EUV lithography optics configuration for sub-9nm resolution

Jens Timo Neumann, Matthias Rösch, Paul Gräupner, Sascha Migura, Bernhard Kneer, Winfried Kaiser, Koen van Ingen Schenau

Proceedings Volume 9422, 94221H (2015) https://doi.org/10.1117/12.2175658

KEYWORDS: Reticles, Imaging systems, Semiconducting wafers, Photomasks, Diffraction, Lithography, Extreme ultraviolet lithography, Image resolution, Source mask optimization, EUV optics

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Proceedings Article | 17 April 2014 Paper

Paper

Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)

Patrick Kearney, Obert Wood, Eric Hendrickx, Greg McIntyre, Soichi Inoue, Frank Goodwin, Stefan Wurm, Jan van Schoot, Winfried Kaiser

Proceedings Volume 9048, 90481O (2014) https://doi.org/10.1117/12.2048397

KEYWORDS: Photomasks, Extreme ultraviolet, Mirrors, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Imaging systems, 3D image processing, Reflectivity, Optical lithography

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Proceedings Article | 1 April 2013 Paper

Paper

Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio

Jens Neumann, Paul Gräupner, Winfried Kaiser, Reiner Garreis, Bernd Geh

Proceedings Volume 8679, 867915 (2013) https://doi.org/10.1117/12.2011455

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Diffraction, Reflectivity, Extreme ultraviolet, Image quality, Image quality standards, Binary data, Projection systems

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Proceedings Article | 1 April 2013 Paper

Paper

Optics for ASML's NXE:3300B platform

Martin Lowisch, Peter Kuerz, Olaf Conradi, Gero Wittich, Wolfgang Seitz, Winfried Kaiser

Proceedings Volume 8679, 86791H (2013) https://doi.org/10.1117/12.2012158

KEYWORDS: Mirrors, EUV optics, Extreme ultraviolet, Optics manufacturing, Extreme ultraviolet lithography, Coating, Ions, Eye, Reflectivity, Neodymium

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Proceedings Article | 8 November 2012 Paper

Paper

Interactions of 3D mask effects and NA in EUV lithography

Jens Neumann, Paul Gräupner, Winfried Kaiser, Reiner Garreis, Bernd Geh

Proceedings Volume 8522, 852211 (2012) https://doi.org/10.1117/12.2009117

KEYWORDS: Photomasks, Reticles, Reflectivity, Image quality, Semiconducting wafers, Extreme ultraviolet lithography, Diffraction, Nanoimprint lithography, Projection systems, Extreme ultraviolet

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Proceedings Article | 20 March 2010 Paper

Paper

Actinic review of EUV masks

Heiko Feldmann, Johannes Ruoff, Wolfgang Harnisch, Winfried Kaiser

Proceedings Volume 7636, 76361C (2010) https://doi.org/10.1117/12.848380

KEYWORDS: Extreme ultraviolet, Photomasks, Mirrors, Scanners, Extreme ultraviolet lithography, EUV optics, Metrology, Zone plates, Photons, Imaging systems

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Proceedings Article | 5 July 2000 Paper

Paper

Advanced technology for extending optical lithography

Christian Wagner, Winfried Kaiser, Jan Mulkens, Donis Flagello

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389046

KEYWORDS: Photomasks, Optical lithography, Polarization, Semiconducting wafers, Silica, Lithography, Laser optics, Standards development, Lens design, Scanners

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Proceedings Article | 26 July 1999 Paper

Paper

Feasibility of printing 0.1-um technology with optical lithography

Mireille Maenhoudt, Staf Verhaegen, Kurt Ronse, Donis Flagello, Bernd Geh, Winfried Kaiser

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354347

KEYWORDS: Critical dimension metrology, Reticles, Electroluminescence, Printing, Lithography, Lithographic illumination, Photomasks, 193nm lithography, Binary data, Resolution enhancement technologies

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Proceedings Article | 25 June 1999 Paper

Paper

EUCLIDES: the European EUVL program

Jozef Benschop, Winfried Kaiser, David Ockwell

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351165

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Synchrotrons, Mirrors, Optical lithography, EUV optics, Reflectivity, Multilayers, Spatial frequencies

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Proceedings Article | 8 September 1995 Paper

Paper

Synergi: a new-generation thermal imaging system

Pierre Marche, Paul Packard, Winfried Kaiser

Proceedings Volume 2552, (1995) https://doi.org/10.1117/12.218288

KEYWORDS: Cameras, Sensors, Signal detection, Imaging systems, Power supplies, Video, Analog electronics, Thermography, Interfaces, Mirrors

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Proceedings Article | 1 January 1991 Paper

Paper

High-precision interferometric testing of spherical mirrors with long radius of curvature

Klaus Freischlad, Michael Kuechel, Wolfgang Wiedmann, Winfried Kaiser, Maximilian Mayer

Proceedings Volume 1332, (1991) https://doi.org/10.1117/12.51046

KEYWORDS: Mirrors, Wavefronts, Interferometers, Interferometry, Spherical lenses, Calibration, Optical testing, Cameras, Monochromatic aberrations, Optical spheres

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Proceedings Article | 1 January 1991 Paper

Paper

Real-time wavefront measurement with lambda/10 fringe spacing for the optical shop

Klaus Freischlad, Michael Kuechel, Karl-Heinz Schuster, Ulrich Wegmann, Winfried Kaiser

Proceedings Volume 1332, (1991) https://doi.org/10.1117/12.51047

KEYWORDS: Wavefronts, Interferometers, Visualization, Calibration, Holograms, Optical testing, Monochromatic aberrations, Video, Interferometry, Optics manufacturing

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Showing 5 of 29 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 8 November 2000

Soft X-Ray and EUV Imaging Systems

Conference Committee Involvement (9)

International Conference on Extreme Ultraviolet Lithography 2024

29 September 2024 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2022

26 September 2022 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2021

27 September 2021 | Online Only, United States

International Conference on Extreme Ultraviolet Lithography 2020

21 September 2020 | Online Only, California, United States

Showing 5 of 9 Conference Committees

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