CONFERENCE PROCEEDINGS
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Wen Lv
at Huazhong Univ of Science and Technology
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Publications (5)
Proceedings Article | 15 March 2016 Paper
Native conflict awared layout decomposition in triple patterning lithography using bin-based library matching method
Xianhua Ke, Hao Jiang, Wen Lv, Shiyuan Liu
Proceedings Volume 9780, 97801F (2016) https://doi.org/10.1117/12.2219144
KEYWORDS: Optical lithography, Lithography, Double patterning technology, Photomasks, Very large scale integration, Process control, Manufacturing, Manufacturing equipment, Integrated circuits, Integrated optics, Current controlled current source
SPIE Journal Paper | 28 April 2014 Open Access
Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography
Wen Lv, Edmund Lam, Haiqing Wei, Shiyuan Liu
JM3, Vol. 13, Issue 02, 023003, (April 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023003
KEYWORDS: Photomasks, Lithography, Optical lithography, Semiconducting wafers, Algorithm development, Imaging systems, SRAF, Optimization (mathematics), Computer simulations, Error analysis
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Proceedings Article | 31 March 2014 Paper
Effective simulation for robust inverse lithography using convolution-variation separation method
Wen Lv, Shiyuan Liu, Xinjiang Zhou, Haiqing Wei
Proceedings Volume 9052, 90522C (2014) https://doi.org/10.1117/12.2046322
KEYWORDS: Lithography, Photomasks, Image processing, Semiconducting wafers, Computer simulations, Optical lithography, Wafer-level optics, Process modeling, Point spread functions, SRAF
SPIE Journal Paper | 8 November 2013 Open Access
Mask-filtering-based inverse lithography
Wen Lv, Qi Xia, Shiyuan Liu
JM3, Vol. 12, Issue 04, 043003, (November 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.043003
KEYWORDS: Photomasks, Lithography, Manufacturing, Gaussian filters, Image processing, Semiconducting wafers, Imaging systems, Filtering (signal processing), Image filtering, Image resolution
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Proceedings Article | 12 April 2013 Paper
Pixel-based inverse lithography using a mask filtering technique
Wen Lv, Qi Xia, Shiyuan Liu
Proceedings Volume 8683, 868325 (2013) https://doi.org/10.1117/12.2011469
KEYWORDS: Photomasks, Manufacturing, Image processing, Lithography, Binary data, Image filtering, Resolution enhancement technologies, Image enhancement, Optimization (mathematics), Imaging systems
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