A novel ion projection lithography (IPL) technique called Maskless Micro-ion-beam Reduction Lithography (MMRL) is currently being developed at the Lawrence Berkeley National Laboratory. This system completely eliminates the first stage of the conventional IPL system that contains the complicated beam optics design in front of the stencil mask. The MMRL system employs an RF-driven multicusp source, a universal pattern generator in place of the conventional stencil mask, and an accelerator column for beam reduction and scanning. The pattern generator is much thicker (40 micrometer) than conventional stencil masks and therefore can provide considerable mechanical stability. Positive hydrogen or helium ions generated in the multicusp source will impinge on the pattern generator with energy on the order of 40 eV and produce minimal heat load and sputtering effects. Ultra-low thermomechanical distortions are predicted by the finite element heat transfer simulations. Additional distortion minimization has also been demonstrated by optimizing the membrane geometry with respect to the pattern area. Descriptions of the MMRL ion-beam source and results for each modeling activity are presented.
A novel IPL technique called Maskless Micro-ion-beam Reduction lithography (MMRL) is being studied for future DRAMs and microprocessors manufacturing. In addition extendible minimum feature sizes to 50 nm or less, required of next generation lithography (NLG) candidates, this MMRL system can completely eliminate the first stage of the conventional IPL system that contains the complicated beam optics design in front of the stencil mask and the mask itself. Its main components consist of a multicusp RF plasma generator, a multi-beamlet extraction system, and an accelerator column for beam reduction. The viability of this MMRL system hinges upon the successful development of these components, most importantly the proposed all-electrostatic accelerator column. This paper describes the different components of the MMRL system and its ion optics. Computational results of beam demagnification and optics optimization are also presented along with design progress of the prototype MMRL system.
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