Dr. Vikrant Chauhan Profile

Dr. Vikrant Chauhan

at GlobalFoundries

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Publications (8)

Proceedings Article | 20 March 2015 Paper

Process variation challenges and resolution in the negative-tone develop double patterning for 20nm and below technology node

Sohan Mehta, Lakshmi Ganta, Vikrant Chauhan, Yixu Wu, Sunil Singh, Chia Ann, Lokesh Subramany, Craig Higgins, Burcin Erenturk, Ravi Srivastava, Paramjit Singh, Hui Peng Koh, David Cho

Proceedings Volume 9425, 94250B (2015) https://doi.org/10.1117/12.2087546

KEYWORDS: Critical dimension metrology, Binary data, Double patterning technology, Etching, Photomasks, Photoresist processing, Nanoimprint lithography, Image processing, Optical lithography, Neodymium

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Immersion based 20nm technology node and below becoming very challenging to chip designers, process and integration due to multiple patterning to integrate one design layer . Negative tone development (NTD) processes have been well accepted by industry experts for enabling technologies 20 nm and below. 193i double patterning is the technology solution for pitch down to 80 nm. This imposes tight control in critical dimension(CD) variation in double patterning where design patterns are decomposed in two different masks such as in litho-etch-litho etch (LELE). CD bimodality has been widely studied in LELE double patterning. A portion of CD tolerance budget is significantly consumed by variations in CD in double patterning.

The objective of this work is to study the process variation challenges and resolution in the Negative Tone Develop Process for 20 nm and Below Technology Node. This paper describes the effect of dose slope on CD variation in negative tone develop LELE process. This effect becomes even more challenging with standalone NTD developer process due to q-time driven CD variation. We studied impact of different stacks with combination of binary and attenuated phase shift mask and estimated dose slope contribution individually from stack and mask type. Mask 3D simulation was carried out to understand theoretical aspect. In order to meet the minimum insulator requirement for the worst case on wafer the overlay and critical dimension uniformity (CDU) budget margins have slimmed. Besides the litho process and tool control using enhanced metrology feedback, the variation control has other dependencies too. Color balancing between the two masks in LELE is helpful in countering effects such as iso-dense bias, and pattern shifting. Dummy insertion and the improved decomposition techniques [2] using multiple lower priority constraints can help to a great extent. Innovative color aware routing techniques [3] can also help with achieving more uniform density and color balanced layouts.

Proceedings Article | 16 March 2015 Paper

EUV telecentricity and shadowing errors impact on process margins

D. Civay, E. Hosler, V. Chauhan, T. Guha Neogi, L. Smith, D. Pritchard

Proceedings Volume 9422, 94220Z (2015) https://doi.org/10.1117/12.2087639

KEYWORDS: Monte Carlo methods, Photomasks, Personal protective equipment, Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Reflectivity, Reliability

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Proceedings Article | 29 March 2013 Paper

Investigation of trench and contact hole shrink mechanism in the negative tone develop process

Sohan Singh Mehta, Craig Higgins, Vikrant Chauhan, Shyam Pal, Hui Peng Koh, Jean Raymond Fakhoury, Shaowen Gao, Lokesh Subramany, Salman Iqbal, Bumhwan Jeon, Pedro Morrison, Chris Karanikas, Yayi Wei, David Cho

Proceedings Volume 8682, 86820O (2013) https://doi.org/10.1117/12.2012331

KEYWORDS: Diffusion, Critical dimension metrology, Polymers, Photoresist processing, Image processing, Manufacturing, Lithography, Optical lithography, Data modeling, Modulation

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Proceedings Article | 20 March 2012 Paper

Assessment of negative tone development challenges

Sohan Mehta, Yongan Xu, Guillaume Landie, Vikrant Chauhan, Sean Burns, Peggy Lawson, Bassem Hamieh, Jerome Wandell, Martin Glodde, Yu Yang Sun, Mark Kelling, Alan Thomas, Jeong Soo Kim, James Chen, Hirokazu Kato, Chiahsun Tseng, Chiew-Seng Koay, Yoshinori Matsui, Martin Burkhardt, Yunpeng Yin, David Horak, Shyng-Tsong Chen, Yann Mignot, Yannick Loquet, Matthew Colburn, John Arnold, Terry Spooner, Lior Huli, Dave Hetzer, Jason Cantone, Shinichiro Kawakami, Shannon Dunn

Proceedings Volume 8325, 832506 (2012) https://doi.org/10.1117/12.917560

KEYWORDS: Semiconducting wafers, Polymers, Optical proximity correction, Reactive ion etching, Etching, Scanning electron microscopy, Neodymium, Photoresist developing, Image processing, Roads

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Proceedings Article | 30 January 2012 Paper

Measuring two ultrashort pulses simultaneously using a single device and on a single shot

Tsz Chun Wong, Justin Ratner, Peter Vaughan, Vikrant Chauhan, Rick Trebino

Proceedings Volume 8247, 82470J (2012) https://doi.org/10.1117/12.906514

KEYWORDS: Ultrafast phenomena, Gaussian pulse, Polarizers, Cameras, Measurement devices, Glasses, Fabry–Perot interferometers, Deconvolution, Laser systems engineering, Polarization

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Proceedings Article | 22 February 2011 Paper

Highly simplified device for measuring the intensity and phase of picosecond pulses

Jacob Cohen, Dongjoo Lee, Vikrant Chauhan, Peter Vaughan, Rick Trebino

Proceedings Volume 7917, 79170V (2011) https://doi.org/10.1117/12.876262

KEYWORDS: Crystals, Laser crystals, Spectral resolution, Second-harmonic generation, Picosecond phenomena, Spectroscopy, Cameras, Measurement devices, Beam splitters, Nonlinear crystals

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Proceedings Article | 17 February 2011 Paper

Measuring complex pulses with time-bandwidth products exceeding 65,000 using multiple-delay crossed-beam spectral interferometry

Jacob Cohen, Pamela Bowlan, Vikrant Chauhan, Peter Vaughan, Rick Trebino

Proceedings Volume 7950, 79500B (2011) https://doi.org/10.1117/12.874794

KEYWORDS: Spectral resolution, Spectrometers, Cameras, Temporal resolution, Interferometry, Fabry–Perot interferometers, Mirrors, Optical fibers, Ultrafast phenomena, Optical filters

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Proceedings Article | 25 February 2009 Paper

Single grism pulse compressor

Vikrant Chauhan, Pamela Bowlan, Edward Miesak, Steve Kane, Rick Trebino

Proceedings Volume 7203, 72030Z (2009) https://doi.org/10.1117/12.809184

KEYWORDS: Diffraction gratings, Mirrors, Ultrafast phenomena, Optical design, Prisms, Transform theory, Reflection, Sapphire, Oscillators, Collimation

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Showing 5 of 8 publications

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