A new concept of a vertical In-Line deposition machine for large area white OLED production has been developed. The
concept targets manufacturing on large substrates (≥ Gen 4, 750 x 920 mm2) using linear deposition source achieving a
total material utilization of ≥ 50 % and tact time down to 80 seconds.
The continuously improved linear evaporation sources for the organic material achieve thickness uniformity on Gen 4
substrate of better than ± 3 % and stable deposition rates down to less than 0.1 nm m/min and up to more than 100 nm
m/min.
For Lithium-Fluoride but also for other high evaporation temperature materials like Magnesium or Silver a linear source
with uniformity better than ± 3 % has been developed.
For Aluminum we integrated a vertical oriented point source using wire feed to achieve high (> 150 nm m/min) and
stable deposition rates.
The machine concept includes a new vertical vacuum handling and alignment system for Gen 4 shadow masks. A
complete alignment cycle for the mask can be done in less than one minute achieving alignment accuracy in the range of
several 10 μm.
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