Mr. Toshikazu Takayama Profile

Toshikazu Takayama

at TOK Taiwan Co Ltd

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 11 April 2006 Paper

Defect studies of resist process for 193nm immersion lithography

Tomoyuki Ando, Katsumi Ohmori, Satoshi Maemori, Toshikazu Takayama, Keita Ishizuka, Masaaki Yoshida, Tomoyuki Hirano, Jiro Yokoya, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa

Proceedings Volume 6153, 615309 (2006) https://doi.org/10.1117/12.656164

KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Resonance energy transfer, Lithography, Materials processing, Bridges, 193nm lithography, Molecular bridges, Lens design

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Proceedings Article | 11 April 2006 Paper

Progress of topcoat and resist development for 193nm immersion lithography

Katsumi Ohmori, Tomoyuki Ando, Toshikazu Takayama, Keita Ishizuka, Masaki Yoshida, Yoshiyuki Utsumi, Kotaro Endo, Takeshi Iwai

Proceedings Volume 6153, 61531X (2006) https://doi.org/10.1117/12.656360

KEYWORDS: Polymers, Immersion lithography, Semiconducting wafers, Photoresist processing, Lithography, Silicon, Scanners, Coating, Manufacturing, 193nm lithography

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