Dr. Toshihisa Tomie Profile

Dr. Toshihisa Tomie

at AIST

SPIE Involvement:

Author

Publications (33)

SPIE Journal Paper | 21 May 2012 Open Access

Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Toshihisa Tomie

JM3, Vol. 11, Issue 02, 021109, (May 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021109

KEYWORDS: Plasma, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Xenon, Magnetism, Opacity, Pulsed laser operation, Gas lasers, Ions

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 11 May 2009 Paper

Actinic EUVL mask blank inspection and phase defect characterization

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7379, 73790H (2009) https://doi.org/10.1117/12.824258

KEYWORDS: Inspection, Defect detection, Photomasks, Particles, Imaging systems, Atomic force microscopy, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Multilayers

Read Abstract +

Proceedings Article | 18 March 2009 Paper

The performance of an actinic full-field EUVL mask blank inspection system

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7271, 72713H (2009) https://doi.org/10.1117/12.813595

KEYWORDS: Inspection, Signal to noise ratio, Imaging systems, Defect detection, Image quality, Photomasks, Charge-coupled devices, Mirrors, Extreme ultraviolet lithography, EUV optics

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Teruo Iwasaki, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7271, 727122 (2009) https://doi.org/10.1117/12.813602

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Mirrors, EUV optics, Light sources, Charge-coupled devices, Defect detection, Multilayers, Defect inspection

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Signal analysis for the actinic full-field EUVL mask blank inspection system

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7122, 71222D (2008) https://doi.org/10.1117/12.801420

KEYWORDS: Inspection, Mirrors, Imaging systems, Point spread functions, Light scattering, Surface roughness, Photomasks, Extreme ultraviolet lithography, Defect detection, Multilayers

Read Abstract +

Proceedings Article | 5 June 2008 Paper

10 kHz 54 W Ti:sapphire regenerative amplifier as a pumping laser of a laser-plasma x-ray source

Isao Matsushima, Hidehiko Yashiro, Toshihisa Tomie

Proceedings Volume 7022, 70220M (2008) https://doi.org/10.1117/12.803939

KEYWORDS: Resonators, Thermal effects, Amplifiers, Optical pumping, Rod lasers, Pulsed laser operation, Cryogenics, X-ray sources, X-rays, Laser applications

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Impact of mask blank and mirror surface roughness on actinic EUVL mask blank inspection signal

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7028, 70281S (2008) https://doi.org/10.1117/12.793070

KEYWORDS: Mirrors, Surface roughness, Photomasks, Inspection, Point spread functions, Light scattering, Spatial frequencies, Extreme ultraviolet lithography, Defect inspection, Charge-coupled devices

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Multilayer bottom topography effect on actinic mask-blank inspection signal

Tsuneo Terasawa, Toshihiko Tanaka, Osamu Suga, Toshihisa Tomie

Proceedings Volume 6607, 66070K (2007) https://doi.org/10.1117/12.728934

KEYWORDS: Inspection, Smoothing, Extreme ultraviolet, Multilayers, Defect inspection, EUV optics, Phase shifts, Photomasks, Extreme ultraviolet lithography, Electromagnetic simulation

Read Abstract +

Proceedings Article | 23 March 2006 Paper

Characterization of CCD sensor for actinic mask blank inspection

Yoshihiro Tezuka, Toshihiko Tanaka, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 6151, 61511U (2006) https://doi.org/10.1117/12.655078

KEYWORDS: Charge-coupled devices, Point spread functions, Inspection, CCD image sensors, Clocks, Extreme ultraviolet lithography, Iron, Extreme ultraviolet, Photomasks, X-rays

Read Abstract +

Proceedings Article | 23 March 2006 Paper

EUV generation using a droplet of a suspension including tin as a target of a high-efficiency LPP source for high volume production

Toshihisa Tomie, - Sarjono, H. Yashiro, H. Moriwaki, I. Matsushima

Proceedings Volume 6151, 61511P (2006) https://doi.org/10.1117/12.656455

KEYWORDS: Extreme ultraviolet, Plasma, Tin, Particles, Extreme ultraviolet lithography, Plasma generation, Pulsed laser operation, Solids, Opacity, YAG lasers

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Actinic detection and signal characterization of multilayer defects on EUV mask blanks

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568379

KEYWORDS: Defect detection, Inspection, Signal detection, Extreme ultraviolet, Atomic force microscopy, Photomasks, Mirrors, Extreme ultraviolet lithography, Statistical analysis, Detection and tracking algorithms

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Actinic detection and screening of multilayer defects on EUV mask blanks using dark-field imaging

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557773

KEYWORDS: Inspection, Extreme ultraviolet, Defect detection, Mirrors, Photomasks, Light sources, Charge-coupled devices, Smoothing, Extreme ultraviolet lithography, EUV optics

Read Abstract +

Proceedings Article | 20 August 2004 Paper

High-speed actinic EUV mask blank inspection with dark-field imaging

Tsuneo Terasawa, Yoshihiro Tezuka, Masaaki Ito, Toshihisa Tomie

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557814

KEYWORDS: Inspection, Photomasks, Signal detection, Extreme ultraviolet, Defect detection, CCD cameras, EUV optics, Extreme ultraviolet lithography, Data acquisition, Light sources

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534915

KEYWORDS: Extreme ultraviolet, Inspection, Photomasks, Light sources, Defect detection, Charge-coupled devices, Mirrors, Signal detection, Extreme ultraviolet lithography, Scattering

Read Abstract +

The development of defect-free mask blanks including inspection is one of the big challenges for the implementation of extreme ultraviolet lithography (EUVL), especially when the introduction of EUVL is rescheduled to a later technology node. Among others, inspection of multilayer coated mask blanks with no oversight of critical defects and with minimal detection of false defects is a challenging issue for providing mask blanks free of defects or with thorough characterization of any existing defects. MIRAI Project has been developing a novel actinic (at-wavelength) inspection tool for detecting critical multilayer defects using a dark-field imaging and a laser-produced plasma (LPP) light source, expecting better sensitivity and better correlation with printability. The first experimental set up is completed for proof-of-concept (POC) demonstration using 20x Schwarzschild imaging optics and a backsideilluminated CCD. An in-house LPP light source is integrated to optimally illuminate the area of interest by EUV with a wavelength of 13.5nm. For its illuminator, a multilayer-coated elliptical mirror is used to illuminate a mask blank with the EUV that is collected within a wide solid angle from the light source. The first EUV dark-field image is obtained from a mask blank with programmed multilayer defects which are manufactured by locating well-defined patterns before depositing Mo/Si multilayer on EUV mask substrate. All the fabricated multilayer defects down to 70nm in width and 3.5nm in height are detected as clear signals that are distinguishable from the background intensity arising from the scattering by the surface roughness of the multilayer-coated mask blank. We have also detected a phase defect as low as 2nm in height. False defect count was not only zero within the area of view but also statistically confirmed to be less than one within the whole area of a mask blank assuming the extrapolation of observed fluctuation of background intensity is applicable. EUV pulse energy measurements and a CCD speed scaling suggested that the inspection throughput of 2 hours per mask blank will be feasible. The actinic tool based on this scheme will, not only serve for benchmarking with non-actinic tools or support multilayer deposition process improvements, but also be a viable choice for qualification of premium EUV mask blanks.

Proceedings Article | 20 May 2004 Paper

Particle-cluster tin target for a high-conversion efficiency LPP source for EUVL

Toshihisa Tomie, Tatsuya Aota, Jing Quan Lin, Yoshifumi Ueno, Hidehiko Yashiro, Noriaki Kandaka, Hiroki Moriwaki, Gohta Niimi, Isao Matsushima, Kentaro Nishigori

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535395

KEYWORDS: Plasma, Particles, Tin, Extreme ultraviolet, Plasma generation, Extreme ultraviolet lithography, Pulsed laser operation, Solids, Mirrors, Ions

Read Abstract +

Proceedings Article | 20 May 2004 Paper

EUV generation using water droplet target

Jing Quan Lin, Hidehiko Yashiro, Tatsuya Aota, Toshihisa Tomie

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534708

KEYWORDS: Plasma, Extreme ultraviolet, YAG lasers, Extreme ultraviolet lithography, Pulsed laser operation, Signal detection, Diodes, Liquids, Semiconductor lasers, Laser stabilization

Read Abstract +