Mr. Thomas Mortelmans Profile

Thomas Mortelmans

at Paul Scherrer Institut

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Publications (1)

Proceedings Article | 21 December 2021 Poster + Presentation + Paper

From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography

T. Allenet, T. Mortelmans, M. Vockenhuber , C-K. Yeh, Y. Ekinci

Proceedings Volume 11854, 1185417 (2021) https://doi.org/10.1117/12.2600920

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scanning electron microscopy, Diffraction gratings, Semiconducting wafers, Proteins, Photoresist materials, Optical lithography

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