Mr. Takeshi Asayama Profile

Takeshi Asayama

at Gigaphoton Inc

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Author

Publications (5)

Proceedings Article | 27 April 2023 Poster + Paper

The development of a machine learning-based excimer laser performance simulator for engineering maintenance decisions

Jacob Strock, Levi Jordan, Yuji Minegishi, Satoshi Tanaka, Katsunori Isomoto, Takeshi Asayama, Takehiko Tomonaga, Yousuke Kawagoe, Yuuki Sakou

Proceedings Volume 12496, 124962U (2023) https://doi.org/10.1117/12.2658043

KEYWORDS: Deep learning, Lithography, Data modeling, Performance modeling, Machine learning, Education and training, Excimer lasers, Device simulation

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Proceedings Article | 27 March 2019 Paper

Extremely long life excimer laser chamber technology for multi-patterning lithography

Hiroaki Tsushima, Yousuke Fujimaki, Yasuaki Kiyota, Makoto Tanaka, Takashi Itou, Takeshi Asayama, Akihiko Kurosu, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10961, 109610X (2019) https://doi.org/10.1117/12.2515667

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Light sources, Semiconductors, Optical lithography, Semiconductor manufacturing, Semiconductor lasers, Laser development

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Proceedings Article | 20 March 2018 Paper

Extremely long life excimer laser technology for multi-patterning lithography

Yousuke Fujimaki, Makoto Tanaka, Takashi Itou, Hirotaka Miyamoto, Miwa Igarashi, Hiroaki Tsushima, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, Hakaru Mizoguchi

Proceedings Volume 10587, 105871J (2018) https://doi.org/10.1117/12.2297341

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Diffraction gratings

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Proceedings Article | 4 April 2014 Paper

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Hiroaki Tsushima, Hisakazu Katsuumi, Hiroyuki Ikeda, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90521E (2014) https://doi.org/10.1117/12.2046189

KEYWORDS: Excimer lasers, Electrodes, 193nm lithography, Lithography, Laser applications, Light sources, Semiconducting wafers, Neodymium, Optical lithography, Semiconductors

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Proceedings Article | 12 April 2013 Paper

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takeshi Asayama, Youichi Sasaki, Takayuki Nagashima, Akihiko Kurosu, Hiroaki Tsushima, Takahito Kumazaki, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 8683, 86831G (2013) https://doi.org/10.1117/12.2011404

KEYWORDS: Excimer lasers, Lithography, Light sources, 193nm lithography, Semiconducting wafers, Laser stabilization, Laser systems engineering, Pulsed laser operation, High power lasers, Extreme ultraviolet

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